Browsing by Author "Hamaguchi, Satoshi"

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    The effect of photoemission on nanosecond helium microdischarges at atmospheric pressure
    (Bristol : IOP Publ., 2018) Donkó, Zoltán; Hamaguchi, Satoshi; Gans, Timo
    Atmospheric-pressure microdischarges excited by nanosecond high-voltage pulses are investigated in helium-nitrogen mixtures by first-principles particle-based simulations, which include VUV resonance radiation transport via the tracing of photon trajectories. The VUV photons, of which the frequency redistribution in the emission processes is included in some detail, are found to modify the computed discharge characteristics remarkably, due to their ability to induce electron emission from the cathode surface. Electrons created this way enhance the plasma density, and a significant increase of the transient current pulse amplitude is observed. The simulations allow the computation of the density of helium atoms in the 21P resonant state, as well as the density of photons in the plasma and the line shape of the resonant VUV radiation reaching the electrodes. These indicate the presence of significant radiation trapping in the plasma and photon escape times longer than the duration of the excitation pulses are found.
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    Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies
    (Bristol : IOP Publ., 2022) Kambara, Makoto; Kawaguchi, Satoru; Lee, Hae June; Ikuse, Kazumasa; Hamaguchi, Satoshi; Ohmori, Takeshi; Ishikawa, Kenji
    Low-temperature plasma-processing technologies are essential for material synthesis and device fabrication. Not only the utilization but also the development of plasma-related products and services requires an understanding of the multiscale hierarchies of complex behaviors of plasma-related phenomena, including plasma generation in physics and chemistry, transport of energy and mass through the sheath region, and morphology- and geometry-dependent surface reactions. Low-temperature plasma science and technology play a pivotal role in the exploration of new applications and in the development and control of plasma-processing methods. Presently, science-based and data-driven approaches to control systems are progressing with the state-of-the-art deep learning, machine learning, and artificial intelligence. In this review, researchers in material science and plasma processing, review and discuss the requirements and challenges of research and development in these fields. In particular, the prediction of plasma parameters and the discovery of processing recipes are asserted by outlining the emerging science-based, data-driven approaches, which are called plasma informatics.