Browsing by Author "Harnisch, Alf"

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    Mechanical properties of microstructurable glasses
    (Offenbach : Verlag der Deutschen Glastechnischen Gesellschaft, 2000) Harnisch, Alf; Hülsenberg, Dagmar
    Microstructurable glasses of the system Li2O-Al2O3-SiO2 are objects of research at the Ilmenau Technical University, Department of Glass- and Ceramics Technology. These glasses also contain alkali oxides and dopants. The dopants are important for the microstructuring. Main directions of research are: the special glass materials, structuring technologies, joining processes and applications. The glasses can be structured with a photolithographic process. This process consists of the following steps: UV exposure, thermal treatment and etching. Using this standard process and variations it is possible to make through structures (e.g. holes), structures with a defined depth, structures with various depths and three-dimensional structures without undercut. Different glass sheets can be joined with a thermal process. Depending on the thermal expansion coefficient glass/metal compounds may be realized by microelectroplating. Deformable structures are very important for applications in the field of measurements and sensors, microgripping technique and microactuators. It is thus necessary to characterize the mechanical properties of these glass structures.
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    Processing techniques for photostructurable glasses
    (Offenbach : Verlag der Deutschen Glastechnischen Gesellschaft, 2003) Mrotzek, Susanne; Harnisch, Alf; Hungenbach, Gudrun; Strahl, Holger; Hülsenberg, Dagmar
    Photostructurable glasses have been known for a long time. Through miniaturization they can be used as micromechanical components, e.g. sensors, grippers, additional components for analytical Instruments, microactuators, fluid and optical components, and numerous other applications. At the Technical University of Ilmenau (Department of Glass and Ceramic Technology) various photostructurable glasses have been developed in the last decade. Additionally, many process-technical investigations were carried out. As a result of these investigations specific parameters were determined creating a basis for the conception of a modular system for the fully automated production of micromechanical glass components. The modular system consists of three modules for the main steps of the process: exposure module, curing module and etching module. Additionally there is a cleaning process integrated in a separate part of the exposure module. The application of the glass wafers is realized by an input magazine, the processed wafers are placed in an output magazine. The system is calculated for small and medium-sized companies and the processing of 10 000 wafers per year.
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    UV laser radiation for microstructuring of photostructurable glasses
    (Offenbach : Verlag der Deutschen Glastechnischen Gesellschaft, 2004) Brokmann, Ulrike; Harnisch, Alf; Ertel-Ingrisch, Werner; Hülsenberg, Dagmar
    Photostructurable glasses are important materials for applications in microsystems. They enable structures with high aspect ratios and a high dependability of mechanical, optical and chemical properties in a large range of temperatures. The exposure of photostructurable glasses to UV laser radiation, as a rapid prototyping technique, is an alternative method to the exposure by a mask aligner. A photostructurable glass (FS21) was exposed to UV laser radiation of the wavelengths 248, 308 and 355 nm. Investigated was the influenee of the exposure parameters wavelength of laser radiation and energy density on structuring results such as crystallization depth, lateral geometry of crystallized areas, structure of crystallized areas and etch angle for single pulse exposure.