Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
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Date
2021
Volume
11
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[London] : Macmillan Publishers Limited, part of Springer Nature
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Abstract
The original version of this Article omitted an affiliation for M. Lisker. The correct affiliations for M. Lisker are listed below: IHP- Leibniz Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236, Frankfurt (Oder), Germany Technical University of Applied Science Wildau, Hochschulring 1, 15745, Wildau, Germany The original Article and accompanying Supplementary Information file have been corrected.
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Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., & Lukosius, M. (2021). Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene. 11. https://doi.org//10.1038/s41598-021-96605-z
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CC BY 4.0 Unported