Generation of high-quality GeV-class electron beams utilizing attosecond ionization injection

dc.bibliographicCitation.firstPage043016eng
dc.bibliographicCitation.issue4eng
dc.bibliographicCitation.journalTitleNew journal of physics : the open-access journal for physicseng
dc.bibliographicCitation.volume23eng
dc.contributor.authorLécz, Zsolt
dc.contributor.authorAndreev, Alexander
dc.contributor.authorKamperidis, Christos
dc.contributor.authorHafz, Nasr
dc.date.accessioned2022-03-30T09:45:17Z
dc.date.available2022-03-30T09:45:17Z
dc.date.issued2021
dc.description.abstractAcceleration of electrons in laser-driven plasma wakefields has been extended up to the 10 GeV energy within a distance of 10s of centimeters. However, in applications, requiring small energy spread within the electron bunch, only a small portion of the bunch can be used and often the low-energy electrons represent undesired background in the spectrum. We present a compact and tunable scheme providing clean and mono-energetic electron bunches with less than one percent energy spread and with central energy on the GeV level. It is a two-step process consisting of ionization injection with attosecond pulses and acceleration in a capillary plasma wave-guide. Semi-analytical theory and particle-in-cell simulations are used to accurately model the injection and acceleration steps.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/8472
dc.identifier.urihttps://doi.org/10.34657/7510
dc.language.isoengeng
dc.publisher[London] : IOPeng
dc.relation.doihttps://doi.org/10.1088/1367-2630/abf076
dc.relation.essn1367-2630
dc.rights.licenseCC BY 4.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/eng
dc.subject.ddc530eng
dc.subject.otherionization injectioneng
dc.subject.otherlaser wakefield accelerationeng
dc.subject.otherlaser wave-guideeng
dc.subject.otherlow emittanceeng
dc.subject.othermono-energetic electron beameng
dc.subject.otherrelativisitc electron beameng
dc.titleGeneration of high-quality GeV-class electron beams utilizing attosecond ionization injectioneng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccesseng
wgl.contributorMBIeng
wgl.subjectPhysikeng
wgl.typeZeitschriftenartikeleng
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