CC BY 4.0 UnportedZallo, EugenioCecchi, StefanoBoschker, Jos E.Mio, Antonio M.Arciprete, FabrizioPrivitera, StefaniaCalarco, Raffaella2023-01-202023-01-202018-3-19https://oa.tib.eu/renate/handle/123456789/10966https://doi.org/10.34657/9992[no abstract available]enghttps://creativecommons.org/licenses/by/4.0/500600Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloysArticle