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- ItemComparison of finite difference and finite volume simulations for a sc-drying mass transport model(Basel : MDPI AG, 2020) Selmer, Ilka; Farrell, Patricio; Smirnova, Irina; Gurikov, PavelDifferent numerical solutions of a previously developed mass transport model for supercritical drying of aerogel particles in a packed bed [Part 1: Selmer et al. 2018, Part 2: Selmer et al. 2019] are compared. Two finite difference discretizations and a finite volume method were used. The finite volume method showed a higher overall accuracy, in the form of lower overall Euclidean norm (l2) and maximum norm (l∞) errors, as well as lower mole balance errors compared to the finite difference methods. Additionally, the finite volume method was more efficient when the condition numbers of the linear systems to be solved were considered. In case of fine grids, the computation time of the finite difference methods was slightly faster but for 16 or fewer nodes the finite volume method was superior. Overall, the finite volume method is preferable for the numerical solution of the described drying model for aerogel particles in a packed bed. © 2020 by the authors. Licensee MDPI, Basel, Switzerland.
- ItemChallenges for drift-diffusion simulations of semiconductors: A comparative study of different discretization philosophies(Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik, 2018) Farrell, Patricio; Peschka, DirkWe analyze and benchmark the error and the convergence order of finite difference, finite-element as well as Voronoi finite-volume discretization schemes for the drift-diffusion equations describing charge transport in bulk semiconductor devices. Three common challenges, that can corrupt the precision of numerical solutions, will be discussed: boundary layers at Ohmic contacts, discontinuties in the doping profile, and corner singularities in L-shaped domains. The influence on the order of convergence is assessed for each computational challenge and the different discretization schemes. Additionally, we provide an analysis of the inner boundary layer asymptotics near Ohmic contacts to support our observations.
- ItemComputational and analytical comparison of flux discretizations for the semiconductor device equations beyond Boltzmann statistics(Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik, 2016) Farrell, Patricio; Koprucki, Thomas; Fuhrmann, JürgenFor a Voronoi finite volume discretization of the van Roosbroeck system with general charge carrier statistics we compare three thermodynamically consistent numerical fluxes known in the literature. We discuss an extension of the Scharfetter-Gummel scheme to non-Boltzmann (e.g. Fermi-Dirac) statistics. It is based on the analytical solution of a two-point boundary value problem obtained by projecting the continuous differential equation onto the interval between neighboring collocation points. Hence, it serves as a reference flux. The exact solution of the boundary value problem can be approximated by computationally cheaper fluxes which modify certain physical quantities. One alternative scheme averages the nonlinear diffusion (caused by the non-Boltzmann nature of the problem), another one modifies the effective density of states. To study the differences between these three schemes, we analyze the Taylor expansions, derive an error estimate, visualize the flux error and show how the schemes perform for a carefully designed p-i-n benchmark simulation. We present strong evidence that the flux discretization based on averaging the nonlinear diffusion has an edge over the scheme based on modifying the effective density of states.