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Small-angle X-ray scattering from GaN nanowires on Si(111): facet truncation rods, facet roughness and Porod's law
Small-angle X-ray scattering from GaN nanowires grown on Si(111) is measured in the grazing-incidence geometry and modelled by means of a Monte Carlo simulation that takes into account the orientational distribution of the faceted nanowires and the roughness of their side facets. It is found that the scattering intensity at large wavevectors does not follow Porod's law I(q) ∝ q-4. The intensity depends on the orientation of the side facets with respect to the incident X-ray beam. It is maximum when the scattering vector is directed along a facet normal, reminiscent of surface truncation rod scattering. At large wavevectors q, the scattering intensity is reduced by surface roughness. A root-mean-square roughness of 0.9 nm, which is the height of just 3-4 atomic steps per micrometre-long facet, already gives rise to a strong intensity reduction. open access.
Top-down fabrication of ordered arrays of GaN nanowires by selective area sublimation
We demonstrate the top-down fabrication of ordered arrays of GaN nanowires by selective area sublimation of pre-patterned GaN(0001) layers grown by hydride vapor phase epitaxy on Al2O3. Arrays with nanowire diameters and spacings ranging from 50 to 90 nm and 0.1 to 0.7 µm, respectively, are simultaneously produced under identical conditions. The sublimation process, carried out under high vacuum conditions, is analyzed in situ by reflection high-energy electron diffraction and line-of-sight quadrupole mass spectrometry. During the sublimation process, the GaN(0001) surface vanishes, giving way to the formation of semi-polar {1103} facets which decompose congruently following an Arrhenius temperature dependence with an activation energy of (3.54 ± 0.07) eV and an exponential prefactor of 1.58 × 1031 atoms per cm2 per s. The analysis of the samples by lowerature cathodoluminescence spectroscopy reveals that, in contrast to dry etching, the sublimation process does not introduce nonradiative recombination centers at the nanowire sidewalls. This technique is suitable for the top-down fabrication of a variety of ordered nanostructures, and could possibly be extended to other material systems with similar crystallographic properties such as ZnO. © 2019 The Royal Society of Chemistry.
Importance of the dielectric contrast for the polarization of excitonic transitions in single GaN nanowires
We investigate the polarization of excitonic transitions of single dispersed GaN nanowires with a diameter of about 50 nm. We observe donor-bound exciton transitions with a linewidth narrower than 250 μeV at 10 K, whereas the luminescence from free excitons exhibits a width of up to 5 meV. This broadening is larger than that observed for free excitons in the as-grown nanowire ensemble and is the result of inhomogeneous strain introduced by the nanowire dispersion. This strain lowers the symmetry of the lattice structure and allows A excitons to emit light polarized parallel to the nanowire axis. The polarization anisotropy of A excitons, however, is found to largely vary from one nanowire to another. In addition, the various bound-exciton lines in a given nanowire do not show the same polarization anisotropies. These findings can be explained by the dielectric contrast between the nanowire and its environment, but only when taking into account the strong variations of the dielectric function of GaN at the near band-edge.