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Foundations of plasma standards

2023, Alves, Luís L., Becker, Markus M., van Dijk, Jan, Gans, Timo, Go, David B., Stapelmann, Katharina, Tennyson, Jonathan, Turner, Miles M., Kushner, Mark J.

The field of low-temperature plasmas (LTPs) excels by virtue of its broad intellectual diversity, interdisciplinarity and range of applications. This great diversity also challenges researchers in communicating the outcomes of their investigations, as common practices and expectations for reporting vary widely in the many disciplines that either fall under the LTP umbrella or interact closely with LTP topics. These challenges encompass comparing measurements made in different laboratories, exchanging and sharing computer models, enabling reproducibility in experiments and computations using traceable and transparent methods and data, establishing metrics for reliability, and in translating fundamental findings to practice. In this paper, we address these challenges from the perspective of LTP standards for measurements, diagnostics, computations, reporting and plasma sources. This discussion on standards, or recommended best practices, and in some cases suggestions for standards or best practices, has the goal of improving communication, reproducibility and transparency within the LTP field and fields allied with LTPs. This discussion also acknowledges that standards and best practices, either recommended or at some point enforced, are ultimately a matter of judgment. These standards and recommended practices should not limit innovation nor prevent research breakthroughs from having real-time impact. Ultimately, the goal of our research community is to advance the entire LTP field and the many applications it touches through a shared set of expectations.

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Enhancing surface production of negative ions using nitrogen doped diamond in a deuterium plasma

2020, Smith, Gregory J., Ellis, James, Moussaoui, Roba, Pardanaud, Cédric, Martin, Céline, Achard, Jocelyn, Issaoui, Riadh, Gans, Timo, Dedrick, James P., Cartry, Gilles

The production of negative ions is of significant interest for applications including mass spectrometry, particle acceleration, material surface processing, and neutral beam injection for magnetic confinement fusion. Methods to improve the efficiency of the surface production of negative ions, without the use of low work function metals, are of interest for mitigating the complex engineering challenges these materials introduce. In this study we investigate the production of negative ions by doping diamond with nitrogen. Negatively biased (-20 V or-130 V), nitrogen doped micro-crystalline diamond films are introduced to a low pressure deuterium plasma (helicon source operated in capacitive mode, 2 Pa, 26 W) and negative ion energy distribution functions are measured via mass spectrometry with respect to the surface temperature (30 °C to 750 °C) and dopant concentration. The results suggest that nitrogen doping has little influence on the yield when the sample is biased at-130 V, but when a relatively small bias voltage of-20 V is applied the yield is increased by a factor of 2 above that of un-doped diamond when its temperature reaches 550 °C. The doping of diamond with nitrogen is a new method for controlling the surface production of negative ions, which continues to be of significant interest for a wide variety of practical applications. © 2020 The Author(s). Published by IOP Publishing Ltd.