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- ItemIn situ Raman spectroscopy on silicon nanowire anodes integrated in lithium ion batteries(Pennington, NJ : Electrochemical Society Inc., 2019) Krause, A.; Tkacheva, O.; Omar, A.; Langklotz, U.; Giebeler, L.; Dörfler, S.; Fauth, F.; Mikolajick, T.; Weber, W.M.Rapid decay of silicon anodes during lithiation poses a significant challenge in application of silicon as an anode material in lithium ion batteries. In situ Raman spectroscopy is a powerful method to study the relationship between structural and electrochemical data during electrode cycling and to allow the observation of amorphous as well as liquid and transient species in a battery cell. Herein, we present in situ Raman spectroscopy on high capacity electrode using uncoated and carbon-coated silicon nanowires during first lithiation and delithiation cycle in an optimized lithium ion battery setup and complement the results with operando X-ray reflection diffraction measurements. During lithiation, we were able to detect a new Raman signal at 1859 cm−1 especially on uncoated silicon nanowires. The detailed in situ Raman measurement of the first lithiation/delithiation cycle allowed to differentiate between morphology changes of the electrode as well as interphase formation from electrolyte components.
- ItemFörderschwerpunkt Laser 2000: Grundlegende Untersuchungen zur hochgenauen, berührungslosen laserinterferometrischen Messung großer Längen im Maschinenbau, Teilvorhaben: Grundlegende Untersuchungen leistungsstarker durchstimmbarer Halbleiterlaserdioden : Schlußbericht(Berlin : Ferdinand-Braun-Institut, 2000) Erbert, G.; Brugge, F.; Fechner, I.; Fredrich, D.; Gielow, M.; Hofmann, L.; Klehr, A.; Klein, A.; Krause, A.; Knauer, A.; Olschewsky, R.; Oster, A.; Rechenberg, I.; Ressel, P.; Sebastian, J.; Selent, R.; Smirnitzki, V.; Tessaro, T.; Thiemann, M.; Thies, A.; Vogel, K.; Wenzel, H.; Weyers, M.; Würfel, J.; Wochatz, P.[no abstract available]
- ItemFörderschwerpunkt NOVALAS : Grundlegende Untersuchungen zur Technologie von Hochleistungsdiodenlasern, Teilvorhaben: Hochleistungsdiodenlaser auf der Basis von Al-freien Quantengräben und Wellenleitern im Wellenlängenbereich 800 - 1000 nm ; Schlussbericht(Berlin : Ferdinand-Braun-Institut, 2001) Erbert, G.; Beister, G.; Brade, P.; Fechner, I.; Fredrich, D.; Fricke, J.; Gielow, M.; Hülsewede, R.; Klein, A.; Krause, A.; Knauer, A.; Maege, J.; Pittroff, W.; Olschewsky, R.; Rechenberg, I.; Ressel, P.; Sebastian, J.; Selent, R.; Staske, R.; Schulze, H.; Sumpf, B; Tessaro, T.; Vogel, K.; Wenzel, H.; Wiechmann, S.; Weyers, M.; Würfel, J.; Wochatz, P.[no abstract available]