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Author: Lebedev, A.M. × Start date: 2010 × Type: Text × Publisher: Amsterdam [u.a.] : Elsevier × WGL Institute: IPHT ×

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    On the possibility of PhotoEmission Electron Microscopy for E. coli advanced studies
    (Amsterdam [u.a.] : Elsevier, 2020) Turishchev, S.Yu.; Marchenko, D.; Sivakov, V.; Belikov, E.A.; Chuvenkova, O.A.; Parinova, E.V.; Koyuda, D.A.; Chumakov, R.G.; Lebedev, A.M.; Kulikova, T.V.; Berezhnoy, A.A.; Valiakhmedova, I.V.; Praslova, N.V.; Preobrazhenskaya, E.V.; Antipov, S.S.
    The novel approach was proposed for detailed high-resolution studies of morphology and physico-chemical properties concomitantly at one measurement spot of E. coli bacterial cells culture immobilized onto silicon wafer surface in UHV conditions applying PhotoEmission Electron Microscopy under Hg lamp irradiation. For the E. coli characterization scanning electron microscopy (electron beam) and X-ray photoelectron spectroscopy (X-ray tube radiation) were applied prior to PhotoEmission Electron Microscopy measurements. In spite of irradiation doses collected for the cell arrays we were successful in detection of high-resolution images even of single E. coli bacterium by PhotoEmission Electron Microscopy technique followed by detailed high-resolution morphology studies by scanning electron microscopy. These results revealed widespread stability of the E. coli membranes shape after the significant number of applied characterization techniques. © 2019 The Authors
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    Peculiarities of electronic structure and composition in ultrasound milled silicon nanowires
    (Amsterdam [u.a.] : Elsevier, 2020) Parinova, E.V.; Pisliaruk, A.K.; Schleusener, A.; Koyuda, D.A.; Chumakov, R.G.; Lebedev, A.M.; Ovsyannikov, R.; Makarova, A.; Smirnov, D.; Sivakov, V.; Turishchev, S.Yu.
    The combined X-ray absorption and emission spectroscopy approach was applied for the detailed electronic structure and composition studies of silicon nanoparticles produced by the ultrasound milling of heavily and lowly doped Si nanowires formed by metal-assisted wet chemical etching. The ultrasoft X-ray emission spectroscopy and synchrotron based X-ray absorption near edges structure spectroscopy techniques were utilize to study the valence and conduction bands electronic structure together with developed surface phase composition qualitative analysis. Our achieved results based on the implemented surface sensitive techniques strongly suggest that nanoparticles under studies show a significant presence of the silicon suboxides depending on the pre-nature of initial Si wafers. The controlled variation of the Si nanoparticles surface composition and electronic structure, including band gap engineering, can open a new prospective for a wide range Si-based nanostructures application including the integration of such structures with organic or biological systems. © 2020