2017, Wang, Ruining, Zhang, Wei, Momand, Jamo, Ronneberger, Ider, Boschker, Jos E., Mazzarello, Riccardo, Kooi, Bart J., Riechert, Henning, Wuttig, Matthias, Calarco, Raffaella

A highly unconventional growth scenario is reported upon deposition of GeTe films on the hydrogen passivated Si(111) surface. Initially, an amorphous film forms for growth parameters that should yield a crystalline material. The entire amorphous film then crystallizes once a critical thickness of four GeTe bilayers is reached, subsequently following the GeTe(111)