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Author: Rathsfeld, Andreas × Subject: inverse scattering ×

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    Comparison of numerical methods for the reconstruction of elastic obstacles from the far-field data of scattered acoustic waves
    (Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik, 2010) Elschner, Johannes; Hsiao, George C.; Rathsfeld, Andreas
    We consider the inverse problem for an elastic body emerged in a fluid due to an acoustic wave. The shape of this obstacle is to be reconstructed from the far-field pattern of the scattered wave. For the numerical solution in the two-dimensional case, we compare a simple Newton type iteration method with the Kirsch-Kress algorithm. Our computational tests reveal that the Kirsch-Kress method converges faster for obstacles with very smooth boundaries. The simple Newton method, however, is more stable in the case of not so smooth domains and more robust with respect to measurement errors.
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    An optimisation method in inverse acoustic scattering by an elastic obstacle
    (Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik, 2008) Elschner, Johannes; Hsiao, George C.; Rathsfeld, Andreas
    We consider the interaction between an elastic body and a compressible inviscid fluid, which occupies the unbounded exterior domain. The inverse problem of determining the shape of such an elastic scatterer from the measured far field pattern of the scattered fluid pressure field is of central importance in detecting and identifying submerged objects. Following a method proposed by Kirsch and Kress, we approximate the acoustic and elastodynamic wave by potentials over auxiliary surfaces, and we reformulate the inverse problem as an optimisation problem. The objective function to be minimised is the sum of three terms. The first is the deviation of the approximate far field pattern from the measured one, the second is a regularisation term, and the last a control term for the transmission condition. We prove that the optimisation problem has a solution and that, for the regularisation parameter tending to zero, the minimisers tend to a solution of the inverse problem. In contrast to a numerical method from a previous paper, the presented method does require neither a direct solution method nor an additional treatment of possible Jones modes.
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    Profile reconstruction in EUV scatterometry: modeling and uncertainty estimates
    (Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik, 2009) Gross, Hermann; Rathsfeld, Andreas; Scholze, Frank; Bär, Markus
    Scatterometry as a non-imaging indirect optical method in wafer metrology is also relevant to lithography masks designed for Extreme Ultraviolet Lithography, where light with wavelengths in the range of 13 nm is applied. The solution of the inverse problem, i.e. the determination of periodic surface structures regarding critical dimensions (CD) and other profile properties from light diffraction patterns, is incomplete without knowledge of the uncertainties associated with the reconstructed parameters. With decreasing feature sizes of lithography masks, increasing demands on metrology techniques and their uncertainties arise. The numerical simulation of the diffraction process for periodic 2D structures can be realized by the finite element solution of the two-dimensional Helmholtz equation. For typical EUV masks the ratio period over wave length is so large, that a generalized finite element method has to be used to ensure reliable results with reasonable computational costs ...