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Now showing 1 - 10 of 13
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    Electron Tomography of Pencil-Shaped GaN/(In,Ga)N Core-Shell Nanowires
    (New York, NY [u.a.] : Springer, 2019) Nicolai, Lars; Gačević, Žarko; Calleja, Enrique; Trampert, Achim
    The three-dimensional structure of GaN/(In,Ga)N core-shell nanowires with multi-faceted pencil-shaped apex is analyzed by electron tomography using high-angle annular dark-field mode in a scanning transmission electron microscope. Selective area growth on GaN-on-sapphire templates using a patterned mask is performed by molecular beam epitaxy to obtain ordered arrays of uniform nanowires. Our results of the tomographic reconstruction allow the detailed determination of the complex morphology of the inner (In,Ga)N multi-faceted shell structure and its deviation from the perfect hexagonal symmetry. The tomogram unambiguously identifies a dot-in-a-wire configuration at the nanowire apex including the exact shape and size, as well as the spatial distribution of its chemical composition. © 2019, The Author(s).
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    Annealing induced atomic rearrangements on (Ga,In) (N,As) probed by hard X-ray photoelectron spectroscopy and X-ray absorption fine structure
    (London : Nature Publishing, 2018) Ishikawa, Fumitaro; Higashi, Kotaro; Fuyuno, Satoshi; Morifuji, Masato; Kondow, Masahiko; Trampert, Achim
    We study the effects of annealing on (Ga0.64,In0.36) (N0.045,As0.955) using hard X-ray photoelectron spectroscopy and X-ray absorption fine structure measurements. We observed surface oxidation and termination of the N-As bond defects caused by the annealing process. Specifically, we observed a characteristic chemical shift towards lower binding energies in the photoelectron spectra related to In. This phenomenon appears to be caused by the atomic arrangement, which produces increased In-N bond configurations within the matrix, as indicated by the X-ray absorption fine structure measurements. The reduction in the binding energies of group-III In, which occurs concomitantly with the atomic rearrangements of the matrix, causes the differences in the electronic properties of the system before and after annealing.
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    Fano-like resonances sustained by Si doped InAsSb plasmonic resonators integrated in GaSb matrix
    (Washington, DC : Optical Society of America, 2015) Taliercio, Thierry; Guilengui, Vilianne NTsame; Cerutti, Laurent; Rodriguez, Jean-Baptiste; Barho, Franziska; Rodrigo, Maria-José Milla; Gonzalez-Posada, Fernando; Tournié, Eric; Niehle, Michael; Trampert, Achim
    By using metal-free plasmonics, we report on the excitation of Fano-like resonances in the mid-infrared where the Fano asymmetric parameter, q, varies when the dielectric environment of the plasmonic resonator changes. We use silicon doped InAsSb alloy deposited by molecular beam epitaxy on GaSb substrate to realize the plasmonic resonators exclusively based on semiconductors. We first demonstrate the possibility to realize high quality samples of embedded InAsSb plasmonic resonators into GaSb host using regrowth technique. The high crystalline quality of the deposited structure is confirmed by scanning transmission electron microscopy (STEM) observation. Second, we report Fano-like resonances associated to localized surface plasmons in both cases: uncovered and covered plasmonic resonators, demonstrating a strong line shape modification. The optical properties of the embedded structures correspond to those modeled by finite-difference time-domain (FDTD) method and by a model based on Fano-like line shape. Our results show that all-semiconductor plasmonics gives the opportunity to build new plasmonic structures with embedded resonators of highly doped semiconductor in a matrix of un-doped semiconductor for mid-IR applications.
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    Epitaxial synthesis of unintentionally doped p-type SnO (001) via suboxide molecular beam epitaxy
    (Melville, NY : AIP, 2023) Egbo, Kingsley; Luna, Esperanza; Lähnemann, Jonas; Hoffmann, Georg; Trampert, Achim; Grümbel, Jona; Kluth, Elias; Feneberg, Martin; Goldhahn, Rüdiger; Bierwagen, Oliver
    By employing a mixed SnO2 + Sn source, we demonstrate suboxide molecular beam epitaxy (S-MBE) growth of phase-pure single-crystalline metastable SnO (001) thin films on Y-stabilized ZrO2 (001) substrates at a growth rate of ∼1.0 nm/min without the need for additional oxygen. These films grow epitaxially across a wide substrate temperature range from 150 to 450 °C. Hence, we present an alternative pathway to overcome the limitations of high Sn or SnO2 cell temperatures and narrow growth windows encountered in previous MBE growth of metastable SnO. In situ laser reflectometry and line-of-sight quadrupole mass spectrometry were used to investigate the rate of SnO desorption as a function of substrate temperature. While SnO ad-molecule desorption at TS = 450 °C was growth-rate limiting, the SnO films did not desorb at this temperature after growth in vacuum. The SnO (001) thin films are transparent and unintentionally p-type doped, with hole concentrations and mobilities in the range of 0.9-6.0 × 1018 cm-3 and 2.0-5.5 cm2 V-1 s-1, respectively. These p-type SnO films obtained at low substrate temperatures are promising for back-end-of-line (BEOL) compatible applications and for integration with n-type oxides in pn heterojunctions and field-effect transistors.
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    Delayed crystallization of ultrathin Gd2O3 layers on Si(111) observed by in situ X-ray diffraction
    (London : BioMed Central, 2012) Hanke, Michael; Kaganer, Vladimir M.; Bierwagen, Oliver; Niehle, Michael; Trampert, Achim
    We studied the early stages of Gd2O3 epitaxy on Si(111) in real time by synchrotron-based, high-resolution X-ray diffraction and by reflection high-energy electron diffraction. A comparison between model calculations and the measured X-ray scattering, and the change of reflection high-energy electron diffraction patterns both indicate that the growth begins without forming a three-dimensional crystalline film. The cubic bixbyite structure of Gd2O3 appears only after a few monolayers of deposition.
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    The Interaction of Extended Defects as the Origin of Step Bunching in Epitaxial III–V Layers on Vicinal Si(001) Substrates
    (Weinheim : Wiley-VCH, 2019) Niehle, Michael; Rodriguez, Jean-Baptiste; Cerutti, Laurent; Tournié, Eric; Trampert, Achim
    Several nanometer high steps are observed by (scanning) transmission electron microscopy at the surface and interfaces in heteroepitaxially grown III–Sb layers on vicinal Si(001) substrates. Their relations with antiphase boundaries (APBs) and threading dislocations (TDs) are elaborated. An asymmetric number density of TDs on symmetry-equivalent {111} lattice planes is revealed and explained according to the substrate miscut and the lattice misfit in the heteroepitaxial material system. Finally, a step bunching mechanism is proposed based on the interplay of APBs, TDs, and the vicinal surface of the miscut substrate.
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    In Situ Transmission Electron Microscopy of Disorder–Order Transition in Epitaxially Stabilized FeGe2
    (Washington, DC : Soc., 2021) Terker, Markus; Nicolai, Lars; Gaucher, Samuel; Herfort, Jens; Trampert, Achim
    Isothermal crystallization of amorphous Ge deposited on a cubic Fe3Si/GaAs(001) substrate is performed by in situ annealing within a transmission electron microscope. It was found that the formation of epitaxially aligned tetragonal FeGe2 is associated with a disorder–order phase transition mainly consisting of a rearrangement of the Fe/vacancy sublattice from a random distribution to alternating filled and empty layers. Additionally, atomically resolved high-angle annular dark-field scanning transmission electron microscopy and energy-dispersive X-ray spectroscopy demonstrated that the vertical lattice spacing of the Ge sublattice reduces across vacancy layers, indicating that strain minimization plays a role in the phase transition process. Crystallization and ordering are both found to proceed layer-by-layer and with square-root-shaped kinetics with a smaller transition rate for the latter.
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    Toward edges-rich MoS2 layers via chemical liquid exfoliation triggering distinctive magnetism
    (Milton Park : Taylor & Francis, 2016) Gao, Guanhui; Chen, Chi; Xie, Xiaobin; Su, Yantao; Kang, Shendong; Zhu, Guichi; Gao, Duyang; Eckert, Jürgen; Trampert, Achim; Cai, Lintao
    The magnetic function of layered molybdenum disulfide (MoS2) has been investigated via simulation, but few reliable experimental results have been explored. Herein, we developed edges-rich structural MoS2 nanosheets via liquid phase exfoliation approach, triggering exceptional ferromagnetism. The magnetic measurements revealed the clear ferromagnetic property of layered MoS2, compared to the pristine MoS2 in bulk exhibiting diamagnetism. The existence of ferromagnetism mostly was attributed to the presence of grain boundaries with abundant irregular edges confirmed by the transmission electron microscopy, magnetic force microscopy and X-ray photoelectron spectroscopy, which experimentally provided reliable evidences on irregular edges-rich states engineering ferromagnetism to clarify theoretical calculation.
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    Engineering grain boundaries at the 2D limit for the hydrogen evolution reaction
    ([London] : Nature Publishing Group UK, 2020) He, Yongmin; Tang, Pengyi; Hu, Zhili; He, Qiyuan; Zhu, Chao; Wang, Luqing; Zeng, Qingsheng; Golani, Prafful; Gao, Guanhui; Fu, Wei; Huang, Zhiqi; Gao, Caitian; Xia, Juan; Wang, Xingli; Wang, Xuewen; Zhu, Chao; Ramasse, Quentin M.; Zhang, Ao; An, Boxing; Zhang, Yongzhe; Martí-Sánchez, Sara; Morante, Joan Ramon; Wang, Liang; Tay, Beng Kang; Yakobson, Boris I.; Trampert, Achim; Zhang, Hua; Wu, Minghong; Wang, Qi Jie; Arbiol, Jordi; Liu, Zheng
    Atom-thin transition metal dichalcogenides (TMDs) have emerged as fascinating materials and key structures for electrocatalysis. So far, their edges, dopant heteroatoms and defects have been intensively explored as active sites for the hydrogen evolution reaction (HER) to split water. However, grain boundaries (GBs), a key type of defects in TMDs, have been overlooked due to their low density and large structural variations. Here, we demonstrate the synthesis of wafer-size atom-thin TMD films with an ultra-high-density of GBs, up to ~1012 cm−2. We propose a climb and drive 0D/2D interaction to explain the underlying growth mechanism. The electrocatalytic activity of the nanograin film is comprehensively examined by micro-electrochemical measurements, showing an excellent hydrogen-evolution performance (onset potential: −25 mV and Tafel slope: 54 mV dec−1), thus indicating an intrinsically high activation of the TMD GBs.
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    Synthesis of quasi-free-standing bilayer graphene nanoribbons on SiC surfaces
    (London : Nature Publishing Group, 2015) Oliveira, Myriano H., Jr.; Lopes, Joao Marcelo J.; Schumann, Timo; Galves, Lauren A.; Ramsteiner, Manfred; Berlin, Katja; Trampert, Achim; Riechert, Henning
    Scaling graphene down to nanoribbons is a promising route for the implementation of this material into devices. Quantum confinement of charge carriers in such nanostructures, combined with the electric field-induced break of symmetry in AB-stacked bilayer graphene, leads to a band gap wider than that obtained solely by this symmetry breaking. Consequently, the possibility of fabricating AB-stacked bilayer graphene nanoribbons with high precision is very attractive for the purposes of applied and basic science. Here we show a method, which includes a straightforward air annealing, for the preparation of quasi-free-standing AB-bilayer nanoribbons with different widths on SiC(0001). Furthermore, the experiments reveal that the degree of disorder at the edges increases with the width, indicating that the narrower nanoribbons are more ordered in their edge termination. In general, the reported approach is a viable route towards the large-scale fabrication of bilayer graphene nanostructures with tailored dimensions and properties for specific applications.