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Author: Weltmann, K.-D. × Subject: Argon ×

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    Atmospheric pressure plasma: A high-performance tool for the efficient removal of biofilms
    (San Francisco, CA : Public Library of Science, 2012) Fricke, K.; Koban, I.; Tresp, H.; Jablonowski, L.; Schröder, K.; Kramer, A.; Weltmann, K.-D.; von Woedtke, T.; Kocher, T.
    Introduction: The medical use of non-thermal physical plasmas is intensively investigated for sterilization and surface modification of biomedical materials. A further promising application is the removal or etching of organic substances, e.g., biofilms, from surfaces, because remnants of biofilms after conventional cleaning procedures are capable to entertain inflammatory processes in the adjacent tissues. In general, contamination of surfaces by micro-organisms is a major source of problems in health care. Especially biofilms are the most common type of microbial growth in the human body and therefore, the complete removal of pathogens is mandatory for the prevention of inflammatory infiltrate. Physical plasmas offer a huge potential to inactivate micro-organisms and to remove organic materials through plasma-generated highly reactive agents. Method: In this study a Candida albicans biofilm, formed on polystyrene (PS) wafers, as a prototypic biofilm was used to verify the etching capability of the atmospheric pressure plasma jet operating with two different process gases (argon and argon/oxygen mixture). The capability of plasma-assisted biofilm removal was assessed by microscopic imaging. Results: The Candida albicans biofilm, with a thickness of 10 to 20 μm, was removed within 300 s plasma treatment when oxygen was added to the argon gas discharge, whereas argon plasma alone was practically not sufficient in biofilm removal. The impact of plasma etching on biofilms is localized due to the limited presence of reactive plasma species validated by optical emission spectroscopy.
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    Nitric oxide density distributions in the effluent of an RF argon APPJ: Effect of gas flow rate and substrate
    (Bristol : IOP, 2014) Iseni, S.; Zhang, S.; Van Gessel, A.F.H.; Hofmann, S.; Van Ham, B.T.J.; Reuter, S.; Weltmann, K.-D.; Bruggeman, P.J.
    The effluent of an RF argon atmospheric pressure plasma jet, the so-called kinpen, is investigated with focus on the nitric-oxide (NO) distribution for laminar and turbulent flow regimes. An additional dry air gas curtain is applied around the plasma effluent to prevent interaction with the ambient humid air. By means of laser-induced fluorescence (LIF) the absolute spatially resolved NO density is measured as well as the rotational temperature and the air concentration. While in the laminar case, the transport of NO is attributed to thermal diffusion; in the turbulent case, turbulent mixing is responsible for air diffusion. Additionally, measurements with a molecular beam mass-spectrometer (MBMS) absolutely calibrated for NO are performed and compared with the LIF measurements. Discrepancies are explained by the contribution of the NO2 and N2O to the MBMS NO signal. Finally, the effect of a conductive substrate in front of the plasma jet on the spatial distribution of NO and air diffusion is also investigated.