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- ItemAtmospheric pressure plasma: A high-performance tool for the efficient removal of biofilms(San Francisco, CA : Public Library of Science, 2012) Fricke, K.; Koban, I.; Tresp, H.; Jablonowski, L.; Schröder, K.; Kramer, A.; Weltmann, K.-D.; von Woedtke, T.; Kocher, T.Introduction: The medical use of non-thermal physical plasmas is intensively investigated for sterilization and surface modification of biomedical materials. A further promising application is the removal or etching of organic substances, e.g., biofilms, from surfaces, because remnants of biofilms after conventional cleaning procedures are capable to entertain inflammatory processes in the adjacent tissues. In general, contamination of surfaces by micro-organisms is a major source of problems in health care. Especially biofilms are the most common type of microbial growth in the human body and therefore, the complete removal of pathogens is mandatory for the prevention of inflammatory infiltrate. Physical plasmas offer a huge potential to inactivate micro-organisms and to remove organic materials through plasma-generated highly reactive agents. Method: In this study a Candida albicans biofilm, formed on polystyrene (PS) wafers, as a prototypic biofilm was used to verify the etching capability of the atmospheric pressure plasma jet operating with two different process gases (argon and argon/oxygen mixture). The capability of plasma-assisted biofilm removal was assessed by microscopic imaging. Results: The Candida albicans biofilm, with a thickness of 10 to 20 μm, was removed within 300 s plasma treatment when oxygen was added to the argon gas discharge, whereas argon plasma alone was practically not sufficient in biofilm removal. The impact of plasma etching on biofilms is localized due to the limited presence of reactive plasma species validated by optical emission spectroscopy.
- ItemInfluence of surface parameters on dielectric-barrier discharges in argon at subatmospheric pressure(Bristol : IOP Publ., 2020) Stankov, M.; Becker, M.M.; Bansemer, R.; Weltmann, K.-D.; Loffhagen, D.The influence of the secondary electron emission coefficient, γ, and the relative permittivity, ɛr, of the dielectric layers on the characteristics of dielectric-barrier discharges (DBDs) is studied by means of numerical modelling and calculated results are compared with experimental data. The analysis has been performed for a geometrically symmetric, plane-parallel DBD in argon with copper electrodes covered by quartz dielectrics. A time-dependent, spatially one-dimensional fluid model involving the drift-diffusion approximation is applied for the numerical analysis of the DBD operating sinusoidally at a frequency of 24 kHz with applied voltages between 1.8 and 3.4 kV and pressures from 100 to 650 mbar. Main features of the model as well as the experimental setup and procedures are given. The modelling studies show especially the sensitivity of the results on the specific choice of γ and ɛr regarding the occurrence and intensity of discharge peaks, the appearance of one or more smaller peaks after the main peak, as well the establishment of a single periodic, multiperiodic or even chaotic temporal evolution of the DBD. In particular, generally good agreement between measured and calculated discharge current signals and the power dissipated in the discharge is found for γ = 0.02 and ɛr = 4.2.