Filters

2018 - 20202

More filters

2021 - 20232
Reset filters

Settings

Author: Zimmer, Klaus × Subject: Fused silica ×

Search Results

Now showing 1 - 2 of 2
  • Thumbnail Image
    Item
    Laser-induced reactive microplasma for etching of fused silica
    (Berlin ; Heidelberg ; New York : Springer, 2020) Ehrhardt, Martin; Lorenz, Pierre; Han, Bing; Zimmer, Klaus
    The ultra-precise machining (UPM) of surfaces with contact-free, beam-based technologies enables the development of flexible and reliable fabrication methods by non-vacuum processes for future application in advanced industrial fields. Laser machining by laser ablation features limitations for ultra-precise machining due to the depth precision, the surface morphology, and laser-induced defect formation. Contrary to physically-based etching, chemical-based dry and wet processing offer high quality, low damage material removal. In order to take advantage of both principles, a combined laser-plasma process is introduced. Ultra-short laser pulses are used to induce a free-standing microplasma in a CF4 gas atmosphere due to an optical breakdown. CF4 gas, with a pressure of 800–900 mbar, is ionized only near the focal point and reactive species are generated therein. Reactive species of the laser-induced microplasma can interact with the surface atoms of the target material forming volatile products. The release of these products is enhanced by the pulsed, laser-induced plasma resulting in material etching. In the present study, SiO2 surfaces were etched with reactive species of CF4 microplasma generated by their laser-induced break down with 775 nm pulses of an fs-laser (150 fs) at a repetition rate of 1 kHz. The dependency of the depth, the width, and the morphology of the etching pits were analysed systematically against the process parameters used. In particular, a linear increase of the etching depth up to 10 µm was achieved. The etched surface appears smooth without visible cracks, defects, or LIPSS (Laser-induced periodic surface structures). © 2020, The Author(s).
  • Thumbnail Image
    Item
    From statistic to deterministic nanostructures in fused silica induced by nanosecond laser radiation
    (Amsterdam [u.a.] : Elsevier, 2018) Lorenz, Pierre; Klöppel, Michael; Zagoranskiy, Igor; Zimmer, Klaus
    The production of structures by laser machining below the diffraction limit is still a challenge. However, self-organization processes can be useful. The laser-induced self-organized modification of the shape of photolithographic produced chromium structures on fused silica as well as the structuring of the fused silica surface by nanosecond UV laser radiation was studied, respectively. Low fluence single pulse laser irradiation (□ > 300 mJ/cm2) cause the formation from chromium squares to droplets due to the mass transport in the molten chromium film. This process is governed by the instability of the molten metal due to the surface tension driven liquid phase mass transport. For a chromium pattern size similar to the instability length two specific droplet distributions were found which are single droplets with a determined position near the centre of the original pattern or random distributed smaller droplets arranged circularly. Each of the metal patterns can be transferred into the fused silica by a multi-pulse irradiation. The experimental results can be simulated well for low fluences by sequential solving the heat and Navier-Stokes equation.