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End date: 2022 × Start date: 2022 × End date: 2024 × Start date: 2020 × DDC: 540 × DDC: 660 × Type: Article × WGL Institute: IOM ×

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    Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma
    (Amsterdam : Elsevier, 2021) Heinke, Robert; Ehrhardt, Martin; Lorenz, Pierre; Zimmer, Klaus
    Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage. These processes, including reactive ion etching (RIE) and plasma etching (PE), are performed at vacuum conditions and provide high selectivity and vertical side wall etched patterns but create high costs and efforts in maintenance due to the required machinery. In contrast to electrically generated plasmas, laser-induced micro plasmas are controllable sources of reactive species in gases at atmospheric pressure that can be used for dry etching of materials. In the present study, we have demonstrated the laser-induced plasma etching of monocrystalline silicon. A Ti:Sapphire laser has been used for igniting an optically pumped plasma in a CF4/O2 gas mixture near atmospheric pressure. The influence of process parameters, like substrate temperature, O2 concentration, plasma-surface distance, etching duration, pulse energy and crystal orientation on etching rate and surface morphology has been investigated. Typical etching rates of 2–12 µm x min−1 can be achieved by varying mentioned parameters with a decreasing etching rate during the process. Different morphologies can be observed due to the parameters set, smooth as well as rough surfaces or even inverted pyramids. The presented etching method provides an approach for precise machining of silicon surfaces with good surface qualities near atmospheric pressure and sufficiently high material removal rates for ultraprecise surface machining. © 2021 The Author(s)
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    Relevance of π-Backbonding for the Reactivity of Electrophilic Anions [B12X11]− (X=F, Cl, Br, I, CN)
    (Weinheim : Wiley-VCH, 2021) Mayer, Martin; Rohdenburg, Markus; Kawa, Sebastian; Horn, Francine; Knorke, Harald; Jenne, Carsten; Tonner, Ralf; Asmis, Knut R.; Warneke, Jonas
    Electrophilic anions of type [B12X11]− posses a vacant positive boron binding site within the anion. In a comparatitve experimental and theoretical study, the reactivity of [B12X11]− with X=F, Cl, Br, I, CN is characterized towards different nucleophiles: (i) noble gases (NGs) as σ-donors and (ii) CO/N2 as σ-donor-π-acceptors. Temperature-dependent formation of [B12X11NG]− indicates the enthalpy order (X=CN)>(X=Cl)≈(X=Br)>(X=I)≈(X=F) almost independent of the NG in good agreement with calculated trends. The observed order is explained by an interplay of the electron deficiency of the vacant boron site in [B12X11]− and steric effects. The binding of CO and N2 to [B12X11]− is significantly stronger. The B3LYP 0 K attachment enthapies follow the order (X=F)>(X=CN)>(X=Cl)>(X=Br)>(X=I), in contrast to the NG series. The bonding motifs of [B12X11CO]− and [B12X11N2]− were characterized using cryogenic ion trap vibrational spectroscopy by focusing on the CO and N2 stretching frequencies (Formula presented.) and (Formula presented.), respectively. Observed shifts of (Formula presented.) and (Formula presented.) are explained by an interplay between electrostatic effects (blue shift), due to the positive partial charge, and by π-backdonation (red shift). Energy decomposition analysis and analysis of natural orbitals for chemical valence support all conclusions based on the experimental results. This establishes a rational understanding of [B12X11]− reactivety dependent on the substituent X and provides first systematic data on π-backdonation from delocalized σ-electron systems of closo-borate anions. © 2021 The Authors. Chemistry - A European Journal published by Wiley-VCH GmbH
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    Membrane Functionalization in Pilot Scale: Roll‐to‐Roll Electron Beam System with Inline Contact Angle Determination
    (Weinheim : Wiley-VCH, 2021) Schulze, Agnes; Drößler, Lutz; Weiß, Steffen; Went, Marco; Abdul Latif, Amira; Breite, Daniel; Fischer, Kristina
    To increase the permeation performance and antifouling properties of polymer membranes, a one-step reaction using electron irradiation was developed. This process combines the surface activation of the membrane polymer and the simultaneous permanent immobilization of hydrophilic molecules. This technology can be applied to various polymers, flat sheet/hollow fiber membranes and all pore ranges. The roll-to-roll system developed for this enables all process steps including inline analysis for quality control of the membrane surface in a continuously operated system. © 2021 The Authors. Chemie Ingenieur Technik published by Wiley-VCH GmbH