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End date: 2019 × Start date: 2010 × DDC: 620 × search.filters.applied.f.series: Scientific Reports, Volume 3 × Subject: Electronic materials ×

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    CVD growth of large area smooth-edged graphene nanomesh by nanosphere lithography
    (London : Nature Publishing Group, 2013) Wang, Min; Fu, Lei; Gan, Lin; Zhang, Chaohua; Rümmeli, Mark; Bachmatiuk, Alicja; Fang, Ying; Liu, Zhongfan
    Current etching routes to process large graphene sheets into nanoscale graphene so as to open up a bandgap tend to produce structures with rough and disordered edges. This leads to detrimental electron scattering and reduces carrier mobility. In this work, we present a novel yet simple direct-growth strategy to yield graphene nanomesh (GNM) on a patterned Cu foil via nanosphere lithography. Raman spectroscopy and TEM characterizations show that the as-grown GNM has significantly smoother edges than post-growth etched GNM. More importantly, the transistors based on as-grown GNM with neck widths of 65-75 nm have a near 3-fold higher mobility than those derived from etched GNM with the similar neck widths.