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    Elastic properties of single crystal Bi12SiO20 as a function of pressure and temperature and acoustic attenuation effects in Bi12 MO20 (M = Si, Ge and Ti)
    (Bristol : IOP Publ., 2020) Haussühl, Eiken; Reichmann, Hans Josef; Schreuer, Jürgen; Friedrich, Alexandra; Hirschle, Christian; Bayarjargal, Lkhamsuren; Winkler, Björn; Alencar, Igor; Wiehl, Leonore; Ganschow, Steffen
    A comprehensive study of sillenite Bi12SiO20 single-crystal properties, including elastic stiffness and piezoelectric coefficients, dielectric permittivity, thermal expansion and molar heat capacity, is presented. Brillouin-interferometry measurements (up to 27 GPa), which were performed at high pressures for the first time, and ab initio calculations based on density functional theory (up to 50 GPa) show the stability of the sillenite structure in the investigated pressure range, in agreement with previous studies. Elastic stiffness coefficients c 11 and c 12 are found to increase continuously with pressure while c 44 increases slightly for lower pressures and remains nearly constant above 15 GPa. Heat-capacity measurements were performed with a quasi-adiabatic calorimeter employing the relaxation method between 2 K and 395 K. No phase transition could be observed in this temperature interval. Standard molar entropy, enthalpy change and Debye temperature are extracted from the data. The results are found to be roughly half of the previous values reported in the literature. The discrepancy is attributed to the overestimation of the Debye temperature which was extracted from high-temperature data. Additionally, Debye temperatures obtained from mean sound velocities derived by Voigt-Reuss averaging are in agreement with our heat-capacity results. Finally, a complete set of electromechanical coefficients was deduced from the application of resonant ultrasound spectroscopy between 103 K and 733 K. No discontinuities in the temperature dependence of the coefficients are observed. High-temperature (up to 1100 K) resonant ultrasound spectra recorded for Bi12 MO20 crystals revealed strong and reversible acoustic dissipation effects at 870 K, 960 K and 550 K for M = Si, Ge and Ti, respectively. Resonances with small contributions from the elastic shear stiffness c 44 and the piezoelectric stress coefficient e 123 are almost unaffected by this dissipation. © 2020 The Author(s). Published by IOP Publishing Ltd.
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    Ge(Sn) nano-island/Si heterostructure photodetectors with plasmonic antennas
    (Bristol : IOP Publ., 2020) Schlykow, Viktoria; Manganelli, Costanza Lucia; Römer, Friedhard; Clausen, Caterina; Augel, Lion; Schulze, Jörg; Katzer, Jens; Schubert, Michael Andreas; Witzigmann, Bernd; Schroeder, Thomas; Capellini, Giovanni; Fischer, Inga Anita
    We report on photodetection in deep subwavelength Ge(Sn) nano-islands on Si nano-pillar substrates, in which self-aligned nano-antennas in the Al contact metal are used to enhance light absorption by means of local surface plasmon resonances. The impact of parameters such as substrate doping and device geometry on the measured responsivities are investigated and our experimental results are supported by simulations of the three-dimensional distribution of the electromagnetic fields. Comparatively high optical responsivities of about 0.1 A W-1 are observed as a consequence of the excitation of localized surface plasmons, making our nano-island photodetectors interesting for applications in which size reduction is essential. © 2020 The Author(s). Published by IOP Publishing Ltd.
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    Control of phase formation of (AlxGa1 - X)2O3thin films on c-plane Al2O3
    (Bristol : IOP Publ., 2020) Hassa, Anna; Wouters, Charlotte; Kneiß, Max; Splith, Daniel; Sturm, Chris; von Wenckstern, Holger; Albrecht, Martin; Lorenz, Michael; Grundmann, Marius
    In this paper, the growth of orthorhombic and monoclinic (Al x Ga1 - x )2O3 thin films on (00.1) Al2O3 by tin-assisted pulsed laser deposition is investigated as a function of oxygen pressure p(O2) and substrate temperature Tg. For certain growth conditions, defined by Tg = 580°C and p(O2) = 0.016 mbar, the orthorhombic ?-polymorph is stabilized. For Tg = 540°C and p(O2) = 0.016 mbar, the ?-, and the ß-, as well as the spinel ?-polymorph coexist, as illustrated by XRD 2?-?-scans. Further employed growth parameters result in thin films with a monoclinic ß-gallia structure. For all polymorphs, p(O2) and Tg affect the formation and desorption of volatile suboxides, and thereby the growth rate and the cation composition. For example, low oxygen pressures lead to low growth rates and enhanced Al incorporation. This facilitates the structural engineering of polymorphic, ternary (Al,Ga)2O3 via selection of the relevant process parameters. Transmission electron microscopy (TEM) studies of a ? - (Al0.13Ga0.87)2O3 thin film reveal a more complex picture compared to that derived from x-ray diffraction measurements. Furthermore, this study presents the possibility of controlling the phase formation, as well as the Al-content, of thin films based on the choice of their growth conditions. © 2020 The Author(s). Published by IOP Publishing Ltd.