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End date: 2024 × Start date: 2020 × DDC: 530 × Subject: Active material × WGL Institute: IHP ×

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    Phase Transitions in Low-Dimensional Layered Double Perovskites: The Role of the Organic Moieties
    (Washington, DC : ACS, 2021) Martín-García, Beatriz; Spirito, Davide; Biffi, Giulia; Artyukhin, Sergey; Francesco Bonaccorso, null; Krahne, Roman
    Halide double perovskites are an interesting alternative to Pb-containing counterparts as active materials in optoelectronic devices. Low-dimensional double perovskites are fabricated by introducing large organic cations, resulting in organic/inorganic architectures with one or more inorganic octahedra layers separated by organic cations. Here, we synthesized layered double perovskites based on 3D Cs2AgBiBr6, consisting of double (2L) or single (1L) inorganic octahedra layers, using ammonium cations of different sizes and chemical structures. Temperature-dependent Raman spectroscopy revealed phase transition signatures in both inorganic lattice and organic moieties by detecting variations in their vibrational modes. Changes in the conformational arrangement of the organic cations to an ordered state coincided with a phase transition in the 1L systems with the shortest ammonium moieties. Significant changes of photoluminescence intensity observed around the transition temperature suggest that optical properties may be affected by the octahedral tilts emerging at the phase transition.
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    Subnanometer Control of the Heteroepitaxial Growth of Multimicrometer-Thick Ge /(Si, Ge) Quantum Cascade Structures
    (College Park, Md. [u.a.] : American Physical Society, 2023) Talamas Simola, Enrico; Montanari, Michele; Corley-Wiciak, Cedric; Di Gaspare, Luciana; Persichetti, Luca; Zöllner, Marvin H.; Schubert, Markus A.; Venanzi, Tommaso; Trouche, Marina Cagnon; Ortolani, Michele; Mattioli, Francesco; Sfuncia, Gianfranco; Nicotra, Giuseppe; Capellini, Giovanni; Virgilio, Michele; De Seta, Monica
    The fabrication of complex low-dimensional quantum devices requires the control of the heteroepitaxial growth at the subnanometer scale. This is particularly challenging when the total thickness of stacked layers of device-active material becomes extremely large and exceeds the multi-μm limit, as in the case of quantum cascade structures. Here, we use the ultrahigh-vacuum chemical vapor deposition technique for the growth of multi-μm-thick stacks of high Ge content strain-balanced Ge/SiGe tunneling heterostructures on Si substrates, designed to serve as the active material in a THz quantum cascade laser. By combining thorough structural investigation with THz spectroscopy absorption experiments and numerical simulations we show that the optimized deposition process can produce state-of-the-art threading dislocation density, ultrasharp interfaces, control of dopant atom position at the nanoscale, and reproducibility within 1% of the layer thickness and composition within the whole multilayer. We show that by using ultrahigh-vacuum chemical vapor deposition one achieves simultaneously a control of the epitaxy down to the sub-nm scale typical of the molecular beam epitaxy, and the high growth rate and technological relevance of chemical vapor deposition. Thus, this technique is a key enabler for the deposition of integrated THz devices and other complex quantum structures based on the Ge/SiGe material system.