Filters

2021 - 20232

More filters

2022 - 20232
Reset filters

Settings

End date: 2024 × Start date: 2020 × DDC: 530 × Subject: Gallium alloys × Subject: III-V semiconductors ×

Search Results

Now showing 1 - 2 of 2
  • Thumbnail Image
    Item
    Strain induced power enhancement of far-UVC LEDs on high temperature annealed AlN templates
    (Melville, NY : American Inst. of Physics, 2023) Knauer, A.; Kolbe, T.; Hagedorn, S.; Hoepfner, J.; Guttmann, M.; Cho, H.K.; Rass, J.; Ruschel, J.; Einfeldt, S.; Kneissl, M.; Weyers, M.
    High temperature annealed AlN/sapphire templates exhibit a reduced in-plane lattice constant compared to conventional non-annealed AlN/sapphire grown by metalorganic vapor phase epitaxy (MOVPE). This leads to additional lattice mismatch between the template and the AlGaN-based ultraviolet-C light emitting diode (UVC LED) heterostructure grown on these templates. This mismatch introduces additional compressive strain in AlGaN quantum wells resulting in enhanced transverse electric polarization of the quantum well emission at wavelengths below 235 nm compared to layer structures deposited on conventional MOVPE-grown AlN templates, which exhibit mainly transverse magnetic polarized emission. In addition, high temperature annealed AlN/sapphire templates also feature reduced defect densities leading to reduced non-radiative recombination. Based on these two factors, i.e., better outcoupling efficiency of the transverse electric polarized light and an enhanced internal quantum efficiency, the performance characteristic of far-UVC LEDs emitting at 231 nm was further improved with a cw optical output power of 3.5 mW at 150 mA.
  • Thumbnail Image
    Item
    783 nm wavelength stabilized DBR tapered diode lasers with a 7 W output power
    (Washington, DC : The Optical Society, 2021) Sumpf, Bernd; Theurer, Lara Sophie; Maiwald, Martin; Müller, André; Maaßdorf, André; Fricke, Jörg; Ressel, Peter; Tränkle, Günther
    Wavelength stabilized distributed Bragg reflector (DBR) tapered diode lasers at 783 nm will be presented. The devices are based on GaAsP single quantum wells embedded in a large optical cavity leading to a vertical far field angle of about 29◦ (full width at half maximum). The 3-inch (7.62 cm) wafers are grown using metalorganic vapor phase epitaxy. In a full wafer process, 4 mm long DBR tapered lasers are manufactured. The devices consist of a 500 µm long 10th order surface DBR grating that acts as rear side mirror. After that, a 1 mm long ridge waveguide section is realized for lateral confinement, which is connected to a 2.5 mm long flared section having a full taper angle of 6◦. At an injection current of 8 A, a maximum output power of about 7 W is measured. At output powers up to 6 W, the measured emission width limited by the resolution of the spectrometer is smaller than 19 pm. Measured at 1/e2 level at this output power, the lateral beam waist width is 11.5 µm, the lateral far field angle 12.5◦, and the lateral beam parameter M2 2.5. The respective parameters measured using the second moments are 31 µm, 15.2◦, and 8.3. 70% of the emitted power is originated from the central lobe. © 2021 Optical Society of America