4 results
Search Results
Now showing 1 - 4 of 4
- ItemSynthesis, Electronic Properties and Reactivity of [B12X11(NO2)]2− (X=F–I) Dianions(Weinheim : Wiley-VCH, 2020) Asmis, Knut R.; Beele, Björn B.; Jenne, Carsten; Kawa, Sebastian; Knorke, Harald; Nierstenhöfer, Marc C.; Wang, Xue-Bin; Warneke, Jonas; Warneke, Ziyan; Yuan, QinqinNitro-functionalized undecahalogenated closo-dodecaborates [B12X11(NO2)]2− were synthesized in high purities and characterized by NMR, IR, and Raman spectroscopy, single crystal X-diffraction, mass spectrometry, and gas-phase ion vibrational spectroscopy. The NO2 substituent leads to an enhanced electronic and electrochemical stability compared to the parent perhalogenated [B12X12]2− (X=F–I) dianions evidenced by photoelectron spectroscopy, cyclic voltammetry, and quantum-chemical calculations. The stabilizing effect decreases from X=F to X=I. Thermogravimetric measurements of the salts indicate the loss of the nitric oxide radical (NO.). The homolytic NO. elimination from the dianion under very soft collisional excitation in gas-phase ion experiments results in the formation of the radical [B12X11O]2−.. Theoretical investigations suggest that the loss of NO. proceeds via the rearrangement product [B12X11(ONO)]2−. The O-bonded nitrosooxy structure is thermodynamically more stable than the N-bonded nitro structure and its formation by radical recombination of [B12X11O]2−. and NO. is demonstrated. © 2020 The Authors. Published by Wiley-VCH GmbH
- ItemDry etching of monocrystalline silicon using a laser-induced reactive micro plasma(Amsterdam : Elsevier, 2021) Heinke, Robert; Ehrhardt, Martin; Lorenz, Pierre; Zimmer, KlausDry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage. These processes, including reactive ion etching (RIE) and plasma etching (PE), are performed at vacuum conditions and provide high selectivity and vertical side wall etched patterns but create high costs and efforts in maintenance due to the required machinery. In contrast to electrically generated plasmas, laser-induced micro plasmas are controllable sources of reactive species in gases at atmospheric pressure that can be used for dry etching of materials. In the present study, we have demonstrated the laser-induced plasma etching of monocrystalline silicon. A Ti:Sapphire laser has been used for igniting an optically pumped plasma in a CF4/O2 gas mixture near atmospheric pressure. The influence of process parameters, like substrate temperature, O2 concentration, plasma-surface distance, etching duration, pulse energy and crystal orientation on etching rate and surface morphology has been investigated. Typical etching rates of 2–12 µm x min−1 can be achieved by varying mentioned parameters with a decreasing etching rate during the process. Different morphologies can be observed due to the parameters set, smooth as well as rough surfaces or even inverted pyramids. The presented etching method provides an approach for precise machining of silicon surfaces with good surface qualities near atmospheric pressure and sufficiently high material removal rates for ultraprecise surface machining. © 2021 The Author(s)
- ItemMembrane Functionalization in Pilot Scale: Roll‐to‐Roll Electron Beam System with Inline Contact Angle Determination(Weinheim : Wiley-VCH, 2021) Schulze, Agnes; Drößler, Lutz; Weiß, Steffen; Went, Marco; Abdul Latif, Amira; Breite, Daniel; Fischer, KristinaTo increase the permeation performance and antifouling properties of polymer membranes, a one-step reaction using electron irradiation was developed. This process combines the surface activation of the membrane polymer and the simultaneous permanent immobilization of hydrophilic molecules. This technology can be applied to various polymers, flat sheet/hollow fiber membranes and all pore ranges. The roll-to-roll system developed for this enables all process steps including inline analysis for quality control of the membrane surface in a continuously operated system. © 2021 The Authors. Chemie Ingenieur Technik published by Wiley-VCH GmbH
- ItemRelevance of π-Backbonding for the Reactivity of Electrophilic Anions [B12X11]− (X=F, Cl, Br, I, CN)(Weinheim : Wiley-VCH, 2021) Mayer, Martin; Rohdenburg, Markus; Kawa, Sebastian; Horn, Francine; Knorke, Harald; Jenne, Carsten; Tonner, Ralf; Asmis, Knut R.; Warneke, JonasElectrophilic anions of type [B12X11]− posses a vacant positive boron binding site within the anion. In a comparatitve experimental and theoretical study, the reactivity of [B12X11]− with X=F, Cl, Br, I, CN is characterized towards different nucleophiles: (i) noble gases (NGs) as σ-donors and (ii) CO/N2 as σ-donor-π-acceptors. Temperature-dependent formation of [B12X11NG]− indicates the enthalpy order (X=CN)>(X=Cl)≈(X=Br)>(X=I)≈(X=F) almost independent of the NG in good agreement with calculated trends. The observed order is explained by an interplay of the electron deficiency of the vacant boron site in [B12X11]− and steric effects. The binding of CO and N2 to [B12X11]− is significantly stronger. The B3LYP 0 K attachment enthapies follow the order (X=F)>(X=CN)>(X=Cl)>(X=Br)>(X=I), in contrast to the NG series. The bonding motifs of [B12X11CO]− and [B12X11N2]− were characterized using cryogenic ion trap vibrational spectroscopy by focusing on the CO and N2 stretching frequencies (Formula presented.) and (Formula presented.), respectively. Observed shifts of (Formula presented.) and (Formula presented.) are explained by an interplay between electrostatic effects (blue shift), due to the positive partial charge, and by π-backdonation (red shift). Energy decomposition analysis and analysis of natural orbitals for chemical valence support all conclusions based on the experimental results. This establishes a rational understanding of [B12X11]− reactivety dependent on the substituent X and provides first systematic data on π-backdonation from delocalized σ-electron systems of closo-borate anions. © 2021 The Authors. Chemistry - A European Journal published by Wiley-VCH GmbH