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- ItemOptical, electrical and chemical properties of PEO:I2 complex composite films(Heidelberg [u.a.] : Springer, 2022) Telfah, Ahmad; Al-Bataineh, Qais M.; Tolstik, Elen; Ahmad, Ahmad A.; Alsaad, Ahmad M.; Ababneh, Riad; Tavares, Carlos J.; Hergenröder, RolandSynthesized PEO:I2 complex composite films with different I2 concentrations were deposited onto fused silica substrates using a dip-coating method. Incorporation of PEO films with I2 increases the electrical conductivity of the composite, reaching a maximum of 46 mS/cm for 7 wt% I2. The optical and optoelectronic properties of the complex composite films were studied using the transmittance and reflectance spectra in the UV-Vis region. The transmittance of PEO decreases with increasing I2 content. From this study, the optical bandgap energy decreases from 4.42 to 3.28 eV as I2 content increases from 0 to 7 wt%. In addition, the refractive index for PEO films are in the range of 1.66 and 2.00.1H NMR spectra of pure PEO film shows two major peaks at 3.224 ppm and 1.038 ppm, with different widths assigned to the mobile polymer chains in the amorphous phase, whereas the broad component is assigned to the more rigid molecules in the crystalline phase, respectively. By adding I2 to the PEO, both peaks (amorphous and crystal) are shifted to lower NMR frequencies indicating that I2 is acting as a Lewis acid, and PEO is acting as Lewis base. Hence, molecular iodine reacts favorably with PEO molecules through a charge transfer mechanism, and the formation of triiodide (I3-), the iodite (IO2-) anion, I 2· · · PEO and I2+···PEO complexes. PEO:I2 complex composite films are expected to be suitable for optical, electrical, and optoelectronic applications.
- ItemNanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition(Heidelberg [u.a.] : Springer, 2017) Liu, Ying; Hirsch, Dietmar; Fechner, Renate; Hong, Yilin; Fu, Shaojun; Frost, Frank; Rauschenbach, BerndThe ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface of fused silica (SiO2). The dependence of the rms roughness and the deposited amount of Al on the distance from the Al source under Ar+ IBS with Al co-deposition was investigated on smooth SiO2, pre-rippled SiO2, and smooth Si surfaces, using atomic force microscopy and X-ray photoelectron spectroscopy. Although the amounts of Al deposited on these three surfaces all decreased with increasing distance from the Al target, the morphology and rms roughness of the smooth Si surface did not demonstrate a strong distance dependence. In contrast to smooth Si, the rms roughness of both the smooth and pre-rippled SiO2 surfaces exhibited a similar distance evolution trend of increasing, decreasing, and final stabilization at the distance where the results were similar to those obtained without Al co-deposition. However, the pre-rippled SiO2 surfaces showed a stronger modulation of rms roughness than the smooth surfaces. At the incidence angles of 60° and 70°, dot-decorated ripples and roof-tiles were formed on the smooth SiO2 surfaces, respectively, whereas nanostructures of closely aligned grains and blazed facets were generated on the pre-rippled SiO2, respectively. The combination of impurity co-deposition with pre-rippled surfaces was found to facilitate the formation of novel types of nanostructures and morphological growth. The initial ripples act as a template to guide the preferential deposition of Al on the tops of the ripples or the ripple sides facing the Al wedge, but not in the valleys between the ripples, leading to 2D grains and quasi-blazed grating, which offer significant promise in optical applications. The rms roughness enhancement is attributed not to AlSi, but to AlOxFy compounds originating mainly from the Al source.
- ItemHidden impurities in transparent conducting oxides: study of vacancies-related defects and impurities in (Cu–Ni) co-doped ZnO films(Heidelberg [u.a.] : Springer, 2022) Al-Bataineh, Qais M.; Ahmad, Ahmad A.; Aljarrah, Ihsan A.; Alsaad, Ahmad M.; Telfah, AhmadThe effect of hydrogen and nitrogen impurities on the physical properties of transparent conductive oxides is investigated in this study. Therefore, 5 wt.% of copper and 5 wt.% of nickel co-doped zinc oxide ((Cu–Ni)/ZnO) films were prepared using the sol–gel method. The (Cu–Ni)/ZnO films were annealed in an oven at 500 °C for 2 h under air, vacuum, nitrogen, and argon atmospheres. The synthesized zinc hydroxide film was transformed to zinc oxide film during the annealing by evaporating H 2O. Films annealed under the mentioned atmosphere including as-prepared one were characterized by analyzing with UV–Vis and FTIR spectra in addition to the 2D mapping electrical conductivity of the surface measured by the 4-point probe. The annealed films under air, vacuum, and argon atmospheres led to generate H-related impurities bounded to the oxygen vacancy (H O) which they act as shallow donor defects resulting in forming (Cu–Ni)/ZnO films into n-type materials. Whereas, the film annealed under a nitrogen atmosphere has N-related defects bounding to the zinc vacancy (N Zn) which they act as shallow acceptor defects resulting in transforming the film from n-type to p-type. These defects affect the optical, electrical, and optoelectronic properties of the (Cu–Ni)/ZnO films.