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    Dielectric barrier discharges: progress on plasma sources and on the understanding of regimes and single filaments
    (Bristol : IOP Publ., 2017-3-30) Brandenburg, Ronny
    Dielectric barrier discharges (DBDs) are plasmas generated in configurations with an insulating (dielectric) material between the electrodes which is responsible for a self-pulsing operation. DBDs are a typical example of nonthermal atmospheric or normal pressure gas discharges. Initially used for the generation of ozone, they have opened up many other fields of application. Therefore DBDs are a relevant tool in current plasma technology as well as an object for fundamental studies. Another motivation for further research is the fact that so-called partial discharges in insulated high voltage systems are special types of DBDs. The breakdown processes, the formation of structures, and the role of surface processes are currently under investigation. This review is intended to give an update to the already existing literature on DBDs considering the research and development within the last two decades. The main principles and different modes of discharge generation are summarized. A collection of known as well as special electrode configurations and reactor designs will be presented. This shall demonstrate the different and broad possibilities, but also the similarities and common aspects of devices for different fields of applications explored within the last years. The main part is devoted to the progress on the investigation of different aspects of breakdown and plasma formation with the focus on single filaments or microdischarges. This includes a summary of the current knowledge on the electrical characterization of filamentary DBDs. In particular, the recent new insights on the elementary volume and surface memory mechanisms in these discharges will be discussed. An outlook for the forthcoming challenges on research and development will be given.
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    Low-temperature atmospheric pressure plasma conversion of polydimethylsiloxane and polysilazane precursor layers to oxide thin films
    (Weinheim : Wiley VCH, 2023) Rudolph, Martin; Birtel, Peter; Arnold, Thomas; Prager, Andrea; Naumov, Sergej; Helmstedt, Ulrike; Anders, André; With, Patrick C.
    We study the conversion of two polymeric silicon precursor compound layers (perhydropolysilazane and polydimethylsiloxane) on a silicon wafer and polyethylene terephthalate substrates to silicon oxide thin films using a pulsed atmospheric pressure plasma jet. Varying the scan velocity and the number of treatments results in various film compositions, as determined by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The mechanism suggested for the conversion process includes the decomposition of the precursor triggered by plasma-produced species, the oxidation of the surface, and finally, the diffusion of oxygen into the film, while gases produced during the precursor decomposition diffuse out of the film. The latter process is possibly facilitated by local plasma heating of the surface. The precursor conversion appears to depend sensitively on the balance between the different contributions to the conversion mechanism.