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- ItemEvaluating arbitrary strain configurations and doping in graphene with Raman spectroscopy(Bristol : IOP Publ., 2017-11-6) Mueller, Niclas S.; Heeg, Sebastian; Peña Alvarez, Miriam; Kusch, Patryk; Wasserroth, Sören; Clark, Nick; Schedin, Fredrik; Parthenios, John; Papagelis, Konstantinos; Galiotis, Costas; Kalbáč, Martin; Vijayaraghavan, Aravind; Huebner, Uwe; Gorbachev, Roman; Frank, Otakar; Reich, StephanieThe properties of graphene depend sensitively on strain and doping affecting its behavior in devices and allowing an advanced tailoring of this material. A knowledge of the strain configuration, i.e. the relative magnitude of the components of the strain tensor, is particularly crucial, because it governs effects like band-gap opening, pseudo-magnetic fields, and induced superconductivity. It also enters critically in the analysis of the doping level. We propose a method for evaluating unknown strain configurations and simultaneous doping in graphene using Raman spectroscopy. In our analysis we first extract the bare peak shift of the G and 2D modes by eliminating their splitting due to shear strain. The shifts from hydrostatic strain and doping are separated by a correlation analysis of the 2D and G frequencies, where we find Delta omega(2D)/Delta omega(G) = 2.21 +/- 0.05 for pure hydrostatic strain. We obtain the local hydrostatic strain, shear strain and doping without any assumption on the strain configuration prior to the analysis, as we demonstrate for two model cases: Graphene under uniaxial stress and graphene suspended on nanostructures that induce strain. Raman scattering with circular corotating polarization is ideal for analyzing frequency shifts, especially for weak strain when the peak splitting by shear strain cannot be resolved.
- ItemMolecular Beam Epitaxy Growth and Characterization of Germanium-Doped Cubic AlxGa1−xN(Weinheim : Wiley-VCH, 2020) Deppe, Michael; Henksmeier, Tobias; Gerlach, Jürgen W.; Reuter, Dirk; As, Donat J.In cubic (c-)GaN Ge has emerged as a promising alternative to Si for n-type doping, offering the advantage of slightly improved electrical properties. Herein, a study on Ge doping of the ternary alloy c-AlxGa1−xN is presented. Ge-doped c-AlxGa1−xN layers are grown by plasma-assisted molecular beam epitaxy. In two sample series, both the Al mole fraction x and the doping level are varied. The incorporation of Ge is verified by time-of-flight secondary ion mass spectrometry. Ge incorporation and donor concentrations rise exponentially with increasing Ge cell temperature. A maximum donor concentration of 1.4 × 1020 cm−3 is achieved. While the incorporation of Ge is almost independent of x, incorporation of O, which acts as an unintentional donor, increases for higher x. Dislocation densities start increasing when doping levels of around 3 × 1019 cm−3 are exceeded. Also photoluminescence intensities begin to drop at these high doping levels. Optical emission of layers with x > 0.25 is found to originate from a defect level 0.9 eV below the indirect bandgap, which is not related to Ge. In the investigated range 0 ≤ x ≤ 0.6, Ge is a suitable donor in c-AlxGa1−xN up to the low 1019 cm−3 range.
- ItemSynthesis of Doped Porous 3D Graphene Structures by Chemical Vapor Deposition and Its Applications(Weinheim : Wiley-VCH, 2019) Ullah, Sami; Hasan, Maria; Ta, Huy Q.; Zhao, Liang; Shi, Qitao; Fu, Lei; Choi, Jinho; Yang, Ruizhi; Liu, Zhongfan; Rümmeli, Mark H.Graphene doping principally commenced to compensate for its inert nature and create an appropriate bandgap. Doping of 3D graphene has emerged as a topic of interest because of attempts to combine its large available surface area—arising from its interconnected porous architecture—with superior catalytic, structural, chemical, and biocompatible characteristics that can be induced by doping. In light of the latest developments, this review provides an overview of the scalable chemical vapor deposition (CVD)-based growth of doped 3D graphene materials as well as their applications in various contexts, such as in devices used for energy generation and gas storage and biosensors. In particular, single- and multielement doping of 3D graphene by various dopants (such as nitrogen (N), boron (B), sulfur (S) and phosphorous (P)), the doping configurations of the resultant materials, an overview of recent developments in the field of CVD, and the influence of various parameters of CVD on graphene doping and 3D morphologies are focused in this paper. Finally, this report concludes the discussion by mentioning the existing challenges and future opportunities of these developing graphitic materials, intending to inspire the unveiling of more exciting functionalized 3D graphene morphologies and their potential properties, which can hopefully realize many possible applications. © 2019 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
- ItemEffect of Ge-doping on the short-wave, mid- and far-infrared intersubband transitions in GaN/AlGaN heterostructures(Bristol : IOP, 2017) Lim, Carolin B.; Ajay, Akhil; Lähnemann, Jonas; Bougerol, Catherine; Monroy, EvaThis paper assesses the effects of Ge-doping on the structural and optical (band-to-band and intersubband (ISB)) properties of GaN/AlGaN multi-quantum wells (QWs) designed to display ISB absorption in the short-wave, mid- and far-infrared ranges (SWIR, MIR, and FIR, respectively). The standard c-plane crystallographic orientation is considered for wells absorbing in the SWIR and MIR spectral regions, whereas the FIR structures are grown along the nonpolar m-axis. In all cases, we compare the characteristics of Ge-doped and Si-doped samples with the same design and various doping levels. The use of Ge appears to improve the mosaicity of the highly lattice-mismatched GaN/AlN heterostructures. However, when reducing the lattice mismatch, the mosaicity is rather determined by the substrate and does not show any dependence on the dopant nature or concentration. From the optical point of view, by increasing the dopant density, we observe a blueshift of the photoluminescence in polar samples due to the screening of the internal electric field by free carriers. In the ISB absorption, on the other hand, there is a systematic improvement of the linewidth when using Ge as a dopant for high doping levels, whatever the spectral region under consideration (i.e. different QW size, barrier composition and crystallographic orientation).
- ItemUntersuchungen zum geordneten Wachstum von III-Nitrid Nanodrähten – Analyse der Nukleations-, Dekompositions- und Diffusionsmechanismen(Berlin : Humboldt-Universität zu Berlin, 2012) Gotschke, TobiasThe influence of the Si- and Mg-doping of InN NWs as well as the selective area growth (SAG) of GaN NWs on Si substrates is developed, optimized and analyzed to obtain NWs with homogeneous periods, lengths and diameters. The variation of growth parameters for Si-doped InN NWs reveals a nonmonotonic morphology dependence and an extended growth window towards higher substrate temperatures. In addition, the NW density is reduced and the size homogeneity improved for high Si doping levels. In contrast, no impact on the morphology of the InN NWs is observed under Mg-doping. Nevertheless, indications of a successful incorporation of the Mg-acceptors are found by optical and electrical studies. The non-selective growth of GaN NWs at high substrate temperatures is investigated for various Ga-fluxes and substrate temperatures. Furthermore, the decomposition of GaN NWs is observed with an investigation of the NW morphology and the Ga desorption during growth. The nucleation on the mask (Si) and the substrate (AlN) is investigated with a new approach to define a growth window for the SAG. Within this window, the influence of the substrate temperature, growth time, Ga- and N-flux on the SAG is investigated by a separate variation for each parameter. An optimal set of growth parameters with respect to a homogeneous NW morphology is obtained. The growth on substrates with different mask types, mask materials and substrate materials reveals a novel nucleation mechanism. The asymmetric nucleation in the holes of the mask could be attributed to a local increase in the Ga-supply by blocking the impinging Ga-flux at the vertical sidewalls. The diffusion of Ga-atoms on the substrate and the NW is finally investigated. A descriptive model is proposed and the fit to experimental data reveals a diffusion length of 400 nm. The limitation of the axial growth is explained by the diffusion length of Ga atoms on the NW sidewall and a diffusion length of approximately 500 nm is obtained. Zugriffsstatistik: