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DDC: 530 × Subject: nonthermal plasma ×

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    Electric field determination in transient plasmas: in situ & non-invasive methods
    (Bristol : IOP Publ., 2022) Goldberg, Benjamin M.; Hoder, Tomáš; Brandenburg, Ronny
    One of the primary basic plasma parameters within transient nonequilibrium plasmas is the reduced electric field strength, roughly understood as the ratio of the electrical energy given to the charged species between two collisions. While physical probes have historically been used for electric field measurements, recent advances in high intensity lasers and sensitive detection methods have allowed for non-invasive optical electric field determination in nearly any discharge configuration with time-resolution up to the sub-nanosecond range and sub-millimeter spatial resolution. This topical review serves to highlight several non-invasive methods for in situ electric field strength determination in transient plasmas ranging from high vacuum environments to atmospheric pressure and above. We will discuss the advantages and proper implementation of (i) laser induced fluorescence dip spectroscopy for measurements in low pressure RF discharges, (ii) optical emission spectroscopy based methods for nitrogen, helium or hydrogen containing discharges, (iii) electric field induced coherent Raman scattering, and (iv) electric field induced second harmonic generation. The physical mechanism for each method will be described as well as basic implementation and highlighting recent results.
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    Development of a model for ultra-precise surface machining of N-BK7® using microwave-driven reactive plasma jet machining
    (Hoboken, NJ : Wiley Interscience, 2019) Kazemi, Faezeh; Boehm, Georg; Arnold, Thomas
    In this paper, extensive studies are conducted as key to overcoming several challenging limitations in applying fluorine-based reactive plasma jet machining (PJM) to surface machining of N-BK7®, particularly regarding the manufacture of freeform optical elements. The chemical composition and lateral distributions of the residual layer are evaluated by X-ray photoelectron spectroscopy and scanning electron microscopy/energy-dispersive X-ray spectroscopy analysis aiming at clarifying the exact chemical kinetics between plasma generated active particles and the N-BK7 surface atoms. Subsequently, a model is developed by performing static etchings to consider the time-varying nonlinearity of the material removal rate and estimate the local etching rate function. Finally, the derived model is extended into the dynamic machining process, and the outcomes are compared with the experimental results.