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- ItemMembrane Functionalization in Pilot Scale: Roll‐to‐Roll Electron Beam System with Inline Contact Angle Determination(Weinheim : Wiley-VCH, 2021) Schulze, Agnes; Drößler, Lutz; Weiß, Steffen; Went, Marco; Abdul Latif, Amira; Breite, Daniel; Fischer, KristinaTo increase the permeation performance and antifouling properties of polymer membranes, a one-step reaction using electron irradiation was developed. This process combines the surface activation of the membrane polymer and the simultaneous permanent immobilization of hydrophilic molecules. This technology can be applied to various polymers, flat sheet/hollow fiber membranes and all pore ranges. The roll-to-roll system developed for this enables all process steps including inline analysis for quality control of the membrane surface in a continuously operated system. © 2021 The Authors. Chemie Ingenieur Technik published by Wiley-VCH GmbH
- ItemAsh transformation mechanism during combustion of rice husk and rice straw(New York, NY [u.a.] : Elsevier, 2022) Beidaghy Dizaji, Hossein; Zeng, Thomas; Hölzig, Hieronymus; Bauer, Jens; Klöß, Gert; Enke, DirkBiomass is an alternative energy resource to fossil fuels because of its potential to reduce greenhouse gas emissions. However, ash-related problems are serious obstacles for this development, especially for the use in combustion plants. Thus, design and operation of biomass boilers require detailed understanding of ash transformation reactions during thermochemical conversion. To evaluate ash transformation in silica-rich biomass fuels, rice husk and rice straw were selected because of their abundance, limited utilization conflicts with the food sector, as well as their potential in both energy and material applications. This paper reveals ash transformation mechanisms relevant for the ash melting behaviour of silica-rich biomass fuels considering chemical and phase composition of the ashes. In this regard, several advanced spectroscopic methods and diffractometry were employed to characterize the materials. The ash transformation reactions and the viscosity were simulated using thermodynamic equilibrium calculations and a slag viscosity modeling toolbox. The results illustrate the impact of impurities on the atomic structure of the silica resulting in an altered ash melting behaviour and viscosity of the silica-rich ashes. Chemical water washing, acid leaching, and blending of rice straw with rice husk strongly influenced the chemical composition of the ashes and improved ash melting behaviour. The analysis also revealed the correlation between the crystalline fraction and the porosity in silica-rich biomass ashes, as well as a crystallinity threshold. These findings are highly relevant for future investigations in boiler designs and production of biogenic silica for material applications.
- ItemSynthesis, Electronic Properties and Reactivity of [B12X11(NO2)]2− (X=F–I) Dianions(Weinheim : Wiley-VCH, 2020) Asmis, Knut R.; Beele, Björn B.; Jenne, Carsten; Kawa, Sebastian; Knorke, Harald; Nierstenhöfer, Marc C.; Wang, Xue-Bin; Warneke, Jonas; Warneke, Ziyan; Yuan, QinqinNitro-functionalized undecahalogenated closo-dodecaborates [B12X11(NO2)]2− were synthesized in high purities and characterized by NMR, IR, and Raman spectroscopy, single crystal X-diffraction, mass spectrometry, and gas-phase ion vibrational spectroscopy. The NO2 substituent leads to an enhanced electronic and electrochemical stability compared to the parent perhalogenated [B12X12]2− (X=F–I) dianions evidenced by photoelectron spectroscopy, cyclic voltammetry, and quantum-chemical calculations. The stabilizing effect decreases from X=F to X=I. Thermogravimetric measurements of the salts indicate the loss of the nitric oxide radical (NO.). The homolytic NO. elimination from the dianion under very soft collisional excitation in gas-phase ion experiments results in the formation of the radical [B12X11O]2−.. Theoretical investigations suggest that the loss of NO. proceeds via the rearrangement product [B12X11(ONO)]2−. The O-bonded nitrosooxy structure is thermodynamically more stable than the N-bonded nitro structure and its formation by radical recombination of [B12X11O]2−. and NO. is demonstrated. © 2020 The Authors. Published by Wiley-VCH GmbH
- ItemDry etching of monocrystalline silicon using a laser-induced reactive micro plasma(Amsterdam : Elsevier, 2021) Heinke, Robert; Ehrhardt, Martin; Lorenz, Pierre; Zimmer, KlausDry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage. These processes, including reactive ion etching (RIE) and plasma etching (PE), are performed at vacuum conditions and provide high selectivity and vertical side wall etched patterns but create high costs and efforts in maintenance due to the required machinery. In contrast to electrically generated plasmas, laser-induced micro plasmas are controllable sources of reactive species in gases at atmospheric pressure that can be used for dry etching of materials. In the present study, we have demonstrated the laser-induced plasma etching of monocrystalline silicon. A Ti:Sapphire laser has been used for igniting an optically pumped plasma in a CF4/O2 gas mixture near atmospheric pressure. The influence of process parameters, like substrate temperature, O2 concentration, plasma-surface distance, etching duration, pulse energy and crystal orientation on etching rate and surface morphology has been investigated. Typical etching rates of 2–12 µm x min−1 can be achieved by varying mentioned parameters with a decreasing etching rate during the process. Different morphologies can be observed due to the parameters set, smooth as well as rough surfaces or even inverted pyramids. The presented etching method provides an approach for precise machining of silicon surfaces with good surface qualities near atmospheric pressure and sufficiently high material removal rates for ultraprecise surface machining. © 2021 The Author(s)
- ItemRelevance of π-Backbonding for the Reactivity of Electrophilic Anions [B12X11]− (X=F, Cl, Br, I, CN)(Weinheim : Wiley-VCH, 2021) Mayer, Martin; Rohdenburg, Markus; Kawa, Sebastian; Horn, Francine; Knorke, Harald; Jenne, Carsten; Tonner, Ralf; Asmis, Knut R.; Warneke, JonasElectrophilic anions of type [B12X11]− posses a vacant positive boron binding site within the anion. In a comparatitve experimental and theoretical study, the reactivity of [B12X11]− with X=F, Cl, Br, I, CN is characterized towards different nucleophiles: (i) noble gases (NGs) as σ-donors and (ii) CO/N2 as σ-donor-π-acceptors. Temperature-dependent formation of [B12X11NG]− indicates the enthalpy order (X=CN)>(X=Cl)≈(X=Br)>(X=I)≈(X=F) almost independent of the NG in good agreement with calculated trends. The observed order is explained by an interplay of the electron deficiency of the vacant boron site in [B12X11]− and steric effects. The binding of CO and N2 to [B12X11]− is significantly stronger. The B3LYP 0 K attachment enthapies follow the order (X=F)>(X=CN)>(X=Cl)>(X=Br)>(X=I), in contrast to the NG series. The bonding motifs of [B12X11CO]− and [B12X11N2]− were characterized using cryogenic ion trap vibrational spectroscopy by focusing on the CO and N2 stretching frequencies (Formula presented.) and (Formula presented.), respectively. Observed shifts of (Formula presented.) and (Formula presented.) are explained by an interplay between electrostatic effects (blue shift), due to the positive partial charge, and by π-backdonation (red shift). Energy decomposition analysis and analysis of natural orbitals for chemical valence support all conclusions based on the experimental results. This establishes a rational understanding of [B12X11]− reactivety dependent on the substituent X and provides first systematic data on π-backdonation from delocalized σ-electron systems of closo-borate anions. © 2021 The Authors. Chemistry - A European Journal published by Wiley-VCH GmbH
- ItemDepth-Resolved Phase Analysis of Expanded Austenite Formed in Austenitic Stainless Steel(Basel : MDPI, 2020) Manova, Darina; Schlenz, Patrick; Gerlach, Jürgen W.; Mändl, StephanExpanded austenite γN formed after nitrogen insertion into austenitic stainless steel and CoCr alloys is known as a hard and very wear resistant phase. Nevertheless, no single composition and lattice expansion can describe this phase with nitrogen in solid solution. Using in situ X-ray diffraction (XRD) during ion beam sputtering of expanded austenite allows a detailed depth-dependent phase analysis, correlated with the nitrogen depth profiles obtained by time-of-flight secondary ion mass spectrometry (ToF-SIMS) or glow discharge optical emission spectroscopy (GDOES). Additionally, in-plane XRD measurements at selected depths were performed for strain analysis. Surprisingly, an anomalous peak splitting for the (200) expanded peak was observed for some samples during nitriding and sputter etching, indicating a layered structure only for {200} oriented grains. The strain analysis as a function of depth and orientation of scattering vector (parallel/perpendicular to the surface) is inconclusive. © 2020 by the authors. Licensee MDPI, Basel, Switzerland.
- ItemReactive plasma cleaning and restoration of transition metal dichalcogenide monolayers(London : Nature Publishing Group, 2021) Marinov, Daniil; de Marneffe, Jean-François; Smets, Quentin; Arutchelvan, Goutham; Bal, Kristof M.; Voronina, Ekaterina; Rakhimova, Tatyana; Mankelevich, Yuri; El Kazzi, Salim; Nalin Mehta, Ankit; Wyndaele, Pieter-Jan; Heyne, Markus Hartmut; Zhang, Jianran; With, Patrick C.; Banerjee, Sreetama; Neyts, Erik C.; Asselberghs, Inge; Lin, Dennis; De Gendt, StefanThe cleaning of two-dimensional (2D) materials is an essential step in the fabrication of future devices, leveraging their unique physical, optical, and chemical properties. Part of these emerging 2D materials are transition metal dichalcogenides (TMDs). So far there is limited understanding of the cleaning of “monolayer” TMD materials. In this study, we report on the use of downstream H2 plasma to clean the surface of monolayer WS2 grown by MOCVD. We demonstrate that high-temperature processing is essential, allowing to maximize the removal rate of polymers and to mitigate damage caused to the WS2 in the form of sulfur vacancies. We show that low temperature in situ carbonyl sulfide (OCS) soak is an efficient way to resulfurize the material, besides high-temperature H2S annealing. The cleaning processes and mechanisms elucidated in this work are tested on back-gated field-effect transistors, confirming that transport properties of WS2 devices can be maintained by the combination of H2 plasma cleaning and OCS restoration. The low-damage plasma cleaning based on H2 and OCS is very reproducible, fast (completed in a few minutes) and uses a 300 mm industrial plasma etch system qualified for standard semiconductor pilot production. This process is, therefore, expected to enable the industrial scale-up of 2D-based devices, co-integrated with silicon technology.
- ItemImproved Adhesion of the DLC Coating Using HiPIMS with Positive Pulses and Plasma Immersion Pretreatment(Basel : MDPI, 2021) Gómez, Iñigo; Claver, Adrián; Santiago, José Antonio; Fernandez, Iván; Palacio, Jose Fernandez; Diaz, Cristina; Mändl, Stephan; Garcia, Jose AntonioDiamond-like carbon (DLC) coatings are used due to their extraordinary tribomechanical properties, great hardness, high elastic modulus, high wear resistance, low friction coefficient and chemical inertness, which provide them with biocompatibility. Compared to other physical vapor deposition (PVD) coatings of transition nitrides and carbonitrides, DLC has limited adhesion, so it is necessary to develop new techniques to overcome this limitation. This work reports the results of scratch testing for the measurement of adhesion and of tests for wear resistance and nanoindentation in AISI 316L stainless steel coated with a WC:C coating, produced using novel high-power impulse magnetron sputtering (HiPIMS) technology with positive pulses. In addition, the use of a preceding surface modification technique, specifically plasma immersion ion implantation (PIII), was studied with the aim of optimizing the adhesion of the coating. The results show how the coating improved the tribomechanical properties through the use of positive pulse HiPIMS compared to conventional HiPIMS, with an adhesion result that reached critical load values of 48.5 N and a wear coefficient of 3.96 × 10−7 mm3/nm