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Publisher: New York : American Institute of Physics × Subject: Ferroelectric materials ×

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Now showing 1 - 2 of 2
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    High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma
    (New York : American Institute of Physics, 2016) Yeh, Chia-Pin; Lisker, Marco; Kalkofen, Bodo; Burte, Edmund P.
    Reactive ion etching (RIE) technology for iridium with CF4/O2/Ar gas mixtures and aluminum mask at high temperatures up to 350 °C was developed. The influence of various process parameters such as gas mixing ratio and substrate temperature on the etch rate was studied in order to find optimal process conditions. The surface of the samples after etching was found to be clean under SEM inspection. It was also shown that the etch rate of iridium could be enhanced at higher process temperature and, at the same time, very high etching selectivity between aluminum etching mask and iridium could be achieved.
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    Evidence for spin to charge conversion in GeTe(111)
    (New York : American Institute of Physics, 2016) Rinaldi, C.; Rojas-Sánchez, J.C.; Wang, R.N.; Fu, Y.; Oyarzun, S.; Vila, L.; Bertoli, S.; Asa, M.; Baldrati, L.; Cantoni, M.; George, J.-M.; Calarco, R.; Fert, A.; Bertacco, R.
    GeTe has been predicted to be the father compound of a new class of multifunctional materials, ferroelectric Rashba semiconductors, displaying a coupling between spin-dependent k-splitting and ferroelectricity. In this paper, we report on epitaxial Fe/GeTe(111) heterostructures grown by molecular beam epitaxy. Spin-pumping experiments have been performed in a radio-frequency cavity by pumping a spin current from the Fe layer into GeTe at the Fe ferromagnetic resonance and detecting the transverse charge current originated in the slab due to spin-to-charge conversion. Preliminary experiments indicate that a clear spin to charge conversion exists, thus unveiling the potential of GeTe for spin-orbitronics.