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    Control of etch pit formation for epitaxial growth of graphene on germanium
    (Melville, NY : American Inst. of Physics, 2019) Becker, Andreas; Wenger, Christian; Dabrowski, Jarek
    Graphene epitaxy on germanium by chemical vapor deposition is a promising approach to integrate graphene into microelectronics, but the synthesis is still accompanied by several challenges such as the high process temperature, the reproducibility of growth, and the formation of etch pits during the process. We show that the substrate cleaning by preannealing in molecular hydrogen, which is crucial to successful and reproducible graphene growth, requires a high temperature and dose. During both substrate cleaning and graphene growth, etch pits can develop under certain conditions and disrupt the synthesis process. We explain the mechanisms how these etch pits may form by preferential evaporation of substrate, how substrate topography is related to the state of the cleaning process, and how etch pit formation during graphene growth can be controlled by choice of a sufficiently high precursor flow. Our study explains how graphene can be grown reliably on germanium at high temperature and thereby lays the foundation for further optimization of the growth process. © 2019 Author(s).
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    Reduce and refine: Plasma treated water vs conventional disinfectants for conveyor-belt cleaning in sustainable food-production lines
    (Melville, NY : American Inst. of Physics, 2021) Weihe, Thomas; Schnabel, Uta; Winter, Hauke; Möller, Timon; Stachowiak, Jörg; Neumann, Sabine; Schlüter, Oliver; Ehlbeck, Jörg
    Sustainable and microbiologically secure foodstuff production lines are of increasing scientific interest and are in the focus of recent research programs. Additionally, they are of great importance for the production industry due to the prevention of food-borne illnesses caused by pathogens such as Salmonella sp., Listeria monocytogenes, or Escherichia coli. These pathogens are responsible for production losses, loss of customer acceptance, and severe food-borne illnesses. A pathogenic threat is frequently combated with sanitizing steps of the production lines. For conveyor band cleaning, this study compares the cleaning abilities of nitric acid (HNO3) and plasma treated water (PTW), which have been sprayed via a commercially available nozzle on two different polymeric surfaces (polysiloxane and polyurethane). Additionally, the cleaning agents HNO3 and PTW have been characterized through their pH and their conductivity. These findings have been underpinned by experiments that focus on a possible influence of nozzle abrasion, such as brass and stainless-steel nanoparticles, on the antimicrobial potential of PTW and HNO3. Adversely acting effects like an enhanced abrasion of conveyer band materials due to PTW or HNO3 treatment have been checked by using light microscopic micrographs and topographic scans in high-resolution mode. Based on the presented results of the experiments, the suitability of an in-place sanitation step in foodstuff production lines has been demonstrated on a laboratory scale.
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    Effect of chemical solvents on the wetting behavior over time of femtosecond laser structured ti6al4v surfaces
    (Basel : MDPI, 2020) Schnell, Georg; Polley, Christian; Bartling, Stephan; Seitz, Hermann
    The effect of chemical solvents on the wetting state of laser-structured surfaces over time is systematically examined in this paper. By using a 300-fs laser, nanostructures were generated on Ti6Al4V, subsequently cleaned in an ultrasonic bath with different solvents and stored in ambient air. The static contact angle showed significant differences for cleaning with various solvents, which, depending on the applied cleaning and time, amounted up to 100°. X-ray photoelectron spectroscopy analyses reveal that the cleaning of the laser-structured surfaces affects the surface chemistry and the aging behavior of the surfaces, even with highly volatile solvents. The effect of the chemical surface modification is particularly noticeable when using alcohols for cleaning, which, due to their OH groups, cause highly hydrophilic behavior of the surface after one day of storage. Over the course of 14 days, enrichment with organic groups from the atmosphere occurs on the surface, which leads to poorer wetting on almost every structured surface. In contrast, the cleaning in hexane leads to a fast saturation of the surface with long-chain carbon groups and thus to a time-independent hydrophobic behavior.