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    Infrared emission bands and thermal effects for 440-nm-emitting GaN-based laser diodes
    (New York, NY : American Institute of Physics Inc., 2020) Mao F.; Hong J.; Wang H.; Chen Y.; Jing C.; Yang P.; Tomm J.W.; Chu J.; Yue F.
    Broad emission bands due to defects in (In,Ga,Al)N laser diodes operating at 440 nm are investigated using continuous-wave and pulsed currents. In addition to known yellow-green and short-wave infrared bands, defect emissions were observed even in the medium-wave infrared range. A separation from thermal radiation is possible. When using pulsed currents, a super-linearly increasing emission occurs at ∼1150 nm, which could be attributed to amplified spontaneous emission mainly due to the electroluminescence of deep defects in the optically active region. These results may be useful in interpreting the output power bottleneck of GaN-based lasers compared to mature GaAs-based lasers. © 2020 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). https://doi.org/10.1063/1.5143802
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    Polarity Control in Group-III Nitrides beyond Pragmatism
    (College Park, Md. [u.a.] : American Physical Society, 2016) Mohn, Stefan; Stolyarchuk, Natalia; Markurt, Toni; Kirste, Ronny; Hoffmann, Marc P.; Collazo, Ramón; Courville, Aimeric; Di Felice, Rosa; Sitar, Zlatko; Vennéguès, Philippe; Albrecht, Martin
    Controlling the polarity of polar semiconductors on nonpolar substrates offers a wealth of device concepts in the form of heteropolar junctions. A key to realize such structures is an appropriate buffer-layer design that, in the past, has been developed by empiricism. GaN or ZnO on sapphire are prominent examples for that. Understanding the basic processes that mediate polarity, however, is still an unsolved problem. In this work, we study the structure of buffer layers for group-III nitrides on sapphire by transmission electron microscopy as an example. We show that it is the conversion of the sapphire surface into a rhombohedral aluminum-oxynitride layer that converts the initial N-polar surface to Al polarity. With the various AlxOyNz phases of the pseudobinary Al2O3-AlN system and their tolerance against intrinsic defects, typical for oxides, a smooth transition between the octahedrally coordinated Al in the sapphire and the tetrahedrally coordinated Al in AlN becomes feasible. Based on these results, we discuss the consequences for achieving either polarity and shed light on widely applied concepts in the field of group-III nitrides like nitridation and low-temperature buffer layers.