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Subject: metrology ×

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    Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin
    (Chester : IUCr, 2018) Siewert, F.; Löchel, B.; Buchheim, J.; Eggenstein, F.; Firsov, A.; Gwalt, G.; Kutz, O.; Lemke, St.; Nelles, B.; Rudolph, I.; Schäfers, F.; Seliger, T.; Senf, F.; Sokolov, A.; Waberski, Ch.; Wolf, J.; Zeschke, T.; Zizak, I.; Follath, R.; Arnold, T.; Frost, F.; Pietag, F.; Erko, A.
    Blazed gratings are of dedicated interest for the monochromatization of synchrotron radiation when a high photon flux is required, such as, for example, in resonant inelastic X-ray scattering experiments or when the use of laminar gratings is excluded due to too high flux densities and expected damage, for example at free-electron laser beamlines. Their availability became a bottleneck since the decommissioning of the grating manufacture facility at Carl Zeiss in Oberkochen. To resolve this situation a new technological laboratory was established at the Helmholtz Zentrum Berlin, including instrumentation from Carl Zeiss. Besides the upgraded ZEISS equipment, an advanced grating production line has been developed, including a new ultra-precise ruling machine, ion etching technology as well as laser interference lithography. While the old ZEISS ruling machine GTM-6 allows ruling for a grating length up to 170 mm, the new GTM-24 will have the capacity for 600 mm (24 inch) gratings with groove densities between 50 lines mm−1 and 1200 lines mm−1. A new ion etching machine with a scanning radiofrequency excited ion beam (HF) source allows gratings to be etched into substrates of up to 500 mm length. For a final at-wavelength characterization, a new reflectometer at a new Optics beamline at the BESSY-II storage ring is under operation. This paper reports on the status of the grating fabrication, the measured quality of fabricated items by ex situ and in situ metrology, and future development goals.
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    Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry
    (Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik, 2012) Gross, Hermann; Henn, Mark-Alexander; Heidenreich, Sebastian; Rathsfeld, Andreas; Bär, Markus
    We investigate the impact of line edge and line width roughness (LER, LWR) on the measured diffraction intensities in angular resolved extreme ultraviolet (EUV) scatterometry for a periodic line-space structure designed for EUV lithography. LER and LWR with typical amplitudes of a few nanometers were previously neglected in the course of the profile reconstruction. The 2D rigorous numerical simulations of the diffraction process for periodic structures are carried out with the finite element method (FEM) providing a numerical solution of the two-dimensional Helmholtz equation. To model roughness, multiple calculations are performed for domains with large periods, containing many pairs of line and space with stochastically chosen line and space widths. A systematic decrease of the mean efficiencies for higher diffraction orders along with increasing variances is observed and established for different degrees of roughness. ...