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Facile production of ultra-fine silicon nanoparticles
2020, Tokarska, Klaudia, Shi, Qitao, Otulakowski, Lukasz, Wrobel, Pawel, Ta, Huy Quang, Kurtyka, Przemyslaw, Kordyka, Aleksandra, Siwy, Mariola, Vasylieva, Margaryta, Forys, Aleksander, Trzebick, Barbara, Bachmatiuk, Alicja, Rümmeli, Mark H.
A facile procedure for the synthesis of ultra-fine silicon nanoparticles without the need for a Schlenk vacuum line is presented. The process consists of the production of a (HSiO1.5)n sol–gel precursor based on the polycondensation of low-cost trichlorosilane (HSiCl3), followed by its annealing and etching. The obtained materials were thoroughly characterized after each preparation step by electron microscopy, Fourier transform and Raman spectroscopy, X-ray dispersion spectroscopy, diffraction methods and photoluminescence spectroscopy. The data confirm the formation of ultra-fine silicon nanoparticles with controllable average diameters between 1 and 5 nm depending on the etching time.