Towards plasma jet controlled charging of a dielectric target at grounded, biased, and floating potential

Abstract

Electric field and surface charge measurements are presented to understand the dynamics in the plasma–surface interaction of a plasma jet and a dielectric surface. The ITO coated backside of the dielectric allowed to impose a DC bias and thus compare the influence of a grounded, biased and floating potential. When imposing a controlled potential at the back of the target, the periodical charging is directly dependent on the pulse length, irrespective of that control potential. This is because the plasma plume is sustained throughout the pulse. When uncontrolled and thus with a floating potential surface, charge accumulation and potential build-up prevents a sustained plasma plume. An imposed DC bias also leads to a continuous surface charge to be present accumulated on the plasma side to counteract the bias. This can lead to much higher electric fields (55 kV/cm) and surface charge (200 nC/cm2) than observed previously. When the plasma jet is turned off, the continuous surface charge decreased to half its value in 25 ms. These results have implications for surface treatment applications.