Modeling and simulation of the lateral photovoltage scanning method

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Date
2020
Volume
2784
Issue
Journal
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Publisher
Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik
Abstract

The fast, cheap and nondestructive lateral photovoltage scanning (LPS) method detects inhomogeneities in semiconductors crystals. The goal of this paper is to model and simulate this technique for a given doping profile. Our model is based on the semiconductor device equations combined with a nonlinear boundary condition, modelling a volt meter. To validate our 2D and 3D finite volume simulations, we use theory developed by Tauc [21] to derive three analytical predictions which our simulation results corroborate, even for anisotropic 2D and 3D meshes. Our code runs about two orders of magnitudes faster than earlier implementations based on commercial software [15]. It also performs well for small doping concentrations which previously could not be simulated at all due to numerical instabilities. Our simulations provide experimentalists with reference laser powers for which meaningful voltages can still be measured. For higher laser power the screening effect does not allow this anymore.

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Keywords
Lateral-photovoltage-scanning method (LPS), semiconductor simulation, van Roosbroeck system, finite volume simulation, crystal growth
Citation
Farrell, P., Kayser, S., & Rotundo, N. (2020). Modeling and simulation of the lateral photovoltage scanning method (Vol. 2784). Berlin : Weierstraß-Institut für Angewandte Analysis und Stochastik. https://doi.org//10.20347/WIAS.PREPRINT.2784
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