Computational Simulations of the Lateral-Photovoltage-Scanning-Method

dc.bibliographicCitation.firstPage012019
dc.bibliographicCitation.journalTitleIOP Conference Series: Materials Science and Engineeringeng
dc.bibliographicCitation.volume355
dc.contributor.authorKayser, S.
dc.contributor.authorLüdge, A.
dc.contributor.authorBöttcher, K.
dc.date.accessioned2023-03-06T07:55:37Z
dc.date.available2023-03-06T07:55:37Z
dc.date.issued2018
dc.description.abstractThe major task for the Lateral-Photovoltage-Scanning-Method is to detect doping striations and the shape of the solid-liquid-interface of an indirect semiconductor crystal. This method is sensitive to the gradient of the charge carrier density. Attempting to simulate the signal generation of the LPS-Method, we are using a three dimensional Finite Volume approach for solving the van Roosbroeck equations with COMSOL Multiphysics in a silicon sample. We show that the simulated LPS-voltage is directly proportional to the gradient of a given doping distribution, which is also the case for the measured LPS-voltage.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/11673
dc.identifier.urihttp://dx.doi.org/10.34657/10706
dc.language.isoeng
dc.publisherLondon [u.a.] : Institute of Physics
dc.relation.doihttps://doi.org/10.1088/1757-899x/355/1/012019
dc.relation.essn1757-899X
dc.relation.issn1757-8981
dc.rights.licenseCC BY 3.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by/3.0
dc.subject.ddc530
dc.subject.gndKonferenzschriftger
dc.subject.otherComputational simulationeng
dc.subject.otherComsol multiphysicseng
dc.subject.otherDoping distributioneng
dc.subject.otherFinite volume approacheng
dc.subject.otherIndirect semiconductoreng
dc.subject.otherScanning methodseng
dc.subject.otherSignal generationeng
dc.subject.otherSolid-liquid interfaceseng
dc.titleComputational Simulations of the Lateral-Photovoltage-Scanning-Methodeng
dc.typeBookParteng
dc.typeTexteng
dcterms.event8th International Scientific Colloquium on Modelling for Materials Processing, 21–22 September 2017, Riga, Latvia
tib.accessRightsopenAccess
wgl.contributorIKZ
wgl.subjectPhysikger
wgl.typeBuchkapitel / Sammelwerksbeitragger
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