Graphene Schottky Junction on Pillar Patterned Silicon Substrate

Abstract

A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly biasand temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector. © 2019 by the authors.

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Citation
Luongo, G., Grillo, A., Giubileo, F., Iemmo, L., Lukosius, M., Chavarin, C. A., et al. (2019). Graphene Schottky Junction on Pillar Patterned Silicon Substrate (Basel : MDPI). Basel : MDPI. https://doi.org//10.3390/nano9050659
License
CC BY 4.0 Unported