Electronic Doping and Enhancement of n‐Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilanes

dc.bibliographicCitation.firstPage2100320eng
dc.bibliographicCitation.issue16eng
dc.bibliographicCitation.journalTitleAdvanced Materials Interfaceseng
dc.bibliographicCitation.volume8eng
dc.contributor.authorShin, Nara
dc.contributor.authorSchellhammer, Karl Sebastian
dc.contributor.authorLee, Min Ho
dc.contributor.authorZessin, Jakob
dc.contributor.authorHambsch, Mike
dc.contributor.authorSalleo, Alberto
dc.contributor.authorOrtmann, Frank
dc.contributor.authorMannsfeld, Stefan C.B.
dc.date.accessioned2022-01-20T07:54:23Z
dc.date.available2022-01-20T07:54:23Z
dc.date.issued2021
dc.description.abstractSelf-assembled monolayers (SAMs) are widely employed in organic field-effect transistors to modify the surface energy, surface roughness, film growth kinetics, and electrical surface potential of the gate oxide to control the device's operating voltage. In this study, amino-functionalized SAM molecules are compared to pure alkylsilane SAMS in terms of their impact on the electrical properties of organic field-effect transistors, using the n-type polycrystalline small molecule semiconductor material N,N′-dioctyl-3,4,9,10-perylenedicarboximide (PTCDI-C8). In order to understand the electronic impact of the amino groups, the effect of both the number of amino-containing functional groups and the SAM molecular length are systematically studied. Though amino-functionalized SAM materials have been studied previously, this study is, for the first time, able to shed light on the nature of the doping effect that occurs when the gate oxide is treated with polar aminosilane materials. By a comprehensive theoretical study of the interface on the molecular level, it is shown that the observed shift in the threshold voltage is caused by free charges, which are attracted to the PTCDI-C8 and are stabilized there by protonated aminosilanes. This attraction and the voltage shift can be systematically tuned by varying the length of the neutral terminal chain of the aminosilane. © 2021 The Authors. Advanced Materials Interfaces published by Wiley-VCH GmbHeng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/7861
dc.identifier.urihttps://doi.org/10.34657/6902
dc.language.isoengeng
dc.publisherWeinheim : Wiley-VCHeng
dc.relation.doihttps://doi.org/10.1002/admi.202100320
dc.relation.essn2196-7350
dc.rights.licenseCC BY-NC-ND 4.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/eng
dc.subject.ddc540eng
dc.subject.ddc600eng
dc.subject.otheraminosilaneseng
dc.subject.othercharge transfereng
dc.subject.othergate oxide modificationeng
dc.subject.otherorganic field-effect transistorseng
dc.subject.otherPTCDI-C8 morphologyeng
dc.titleElectronic Doping and Enhancement of n‐Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilaneseng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccesseng
wgl.contributorIFWDeng
wgl.subjectChemieeng
wgl.typeZeitschriftenartikeleng
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