Behaviour of rf sputter deposited SiO2 and AI2O3 diffusion barriers on float glass at 300 °C in air
| dc.bibliographicCitation.firstPage | 331 | |
| dc.bibliographicCitation.issue | 12 | |
| dc.bibliographicCitation.journalTitle | Glastechnische Berichte | |
| dc.bibliographicCitation.lastPage | 333 | |
| dc.bibliographicCitation.volume | 66 | |
| dc.contributor.author | Chaissac, Martine | |
| dc.contributor.author | Claus, Jürgen | |
| dc.contributor.author | Borchardt, Günter | |
| dc.contributor.author | Slowik, Jacek | |
| dc.contributor.author | Frischat, Günther Heinz | |
| dc.contributor.author | Scherrer, Stanislas | |
| dc.contributor.author | Weber, Sylvain | |
| dc.date.accessioned | 2024-08-27T15:17:41Z | |
| dc.date.available | 2024-08-27T15:17:41Z | |
| dc.date.issued | 1993 | |
| dc.description.abstract | In order to study the resistance of high-frequency sputtered thin SiO<sub>2</sub> and AI<sub>2</sub>O<sub>3</sub> coatings on float glass to sodium diffusion, coated glasses were submitted to heat treatments in air. The element distribution in the coatings and in the substrates was measured with neutral primary beam-secondary ion mass spectrometry. | eng |
| dc.description.abstract | Um die sperrende Wirkung von hochfrequenzgesputterten dünnen SiO<sub>2</sub>- und Al<sub>2</sub>O<sub>3</sub>-Schichten auf Floatglas hinsichtlich der Natriumdiffusion zu untersuchen, wurden beschichtete Gläser einer Wärmebehandlung an Luft unterzogen. Die Elementverteilung in den Schichten und in den Substraten wurde mit der Neutral-Teilchen-Sekundärionen-Massenspektrometrie gemessen. | ger |
| dc.description.version | publishedVersion | |
| dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/14993 | |
| dc.identifier.uri | https://doi.org/10.34657/14015 | |
| dc.language.iso | eng | |
| dc.publisher | Offenbach : Verlag der Deutschen Glastechnischen Gesellschaft | |
| dc.relation.issn | 0017-1085 | |
| dc.rights.license | CC BY 3.0 DE | |
| dc.rights.uri | https://creativecommons.org/licenses/by/3.0/de/ | |
| dc.subject.ddc | 660 | |
| dc.title | Behaviour of rf sputter deposited SiO2 and AI2O3 diffusion barriers on float glass at 300 °C in air | eng |
| dc.title.alternative | Verhalten mittels Hochfrequenz-Plasmazerstäubung hergestellter Diffusionssperrschichten aus SiO2 und AI2O3 auf Floatglas bei 300 °C in Luft | ger |
| dc.type | Article | |
| tib.accessRights | openAccess |
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