Advanced layer systems and coating techniques for large-area glass coatings by means of high-rate sputtering

Abstract

The application of high-rate sputtering for large-area glass coating aims at the improvement of the glass properties by antisolar and low-emissivity coatings. The first part of the present paper deals with a new low-emissivity coating, which is based on a so-called double-blocking layer arrangement for protection of the infrared-reflecting silver layer. Compared to conventional layer stacks an improved resistance against environmental attacks (humidity, salt, sulphur dioxide) is found. A new application of high-rate sputtering for glass coating is the manufacturing of conductive and semitransparent antireflective thin film systems for data display screens. A system based upon TiN layers is discussed. Layer stacks on glass mostly include dielectric films, which have to be deposited by reactive sputter processes. Process stability and layer quality may suffer from arc discharges. The second part of the paper deals with new developments for the improvement of process long-term stability. The operation principle of an arc suppressor interface for DC-reactive sputtering is explained. Finally a mid-frequency-powered twin magnetron for reactive sputter deposition of highly insulating films (SiO2, Si3N4, AI2O3) is presented, which enables long-term stable processes at very high deposition rates.