Nanotrimer enhanced optical fiber tips implemented by electron beam lithography

Abstract

Here we present a novel fabrication approach that allows for the implementation of sophisticated planar nanostructures with deep subwavelength dimensions on fiber end faces by electron beam lithography. Specifically, we planarize the end faces of fiber bundles such that they are compatible with planar nanostructuring technology, with the result that fibers can be treated in the same way as typical wafers, opening up the entire field of nanotechnology for fiber optics. To demonstrate our approach, we have implemented densely-packed arrays of gold nanotrimers on the end face of 50 cm long standard single mode fibers, showing asymmetrical resonance lineshapes that arise due to the interplay of diffractive coupling of the individual timer response at infrared wavelengths that overlap with the single mode regime of typical telecommunication fibers. Refractive index sensing experiments suggest sensitivities of about 390 nm/RIU, representing the state-of-the-art for such a device type. Due to its unique capability of making optical fibers compatible with planar nanostructuring technology, we anticipate our approach to be applied in numerous fields including bioanalytics, telecommunications, nonlinear photonics, optical trapping and beam shaping.