Advances in group-III-nitride photodetectors

dc.bibliographicCitation.firstPage1eng
dc.bibliographicCitation.volume4eng
dc.contributor.authorRivera, C.
dc.contributor.authorPereiro, J.
dc.contributor.authorNavarro, A.
dc.contributor.authorMuñoz, E.
dc.contributor.authorBrandt, O.
dc.contributor.authorGrahn, H.T.
dc.date.accessioned2020-08-12T05:34:50Z
dc.date.available2020-08-12T05:34:50Z
dc.date.issued2010
dc.description.abstractGroup-III nitrides are considered to be a strategic technology for the development of ultraviolet photodetectors due to their remarkable properties in terms of spectral selectivity, radiation hardness, and noise. The potential advantages of these materials were initially obscured by their large density of intrinsic defects. The advances were thus associated in general with improvements in material quality. Although technology still also needs improvement, efforts are being intensified in the fabrication of advanced structures for photodetector applications. In particular, this review discusses the recent progress in group-III-nitride photodetectors, emphasizing the work reported on quantum-well-based photodetectors, the use of novel structures exploiting the effect of piezoelectric polarization-induced fields, and polarization-sensitive photodetectors. Furthermore, some ideas can be generalized to other material systems such as ZnO and their related compounds, which exhibit the same crystal structure as group-III nitrides. © Rivera et al.; Licensee Bentham Open.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://doi.org/10.34657/4113
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/5484
dc.language.isoengeng
dc.publisherSharjah [u.a.] : Bentham Openeng
dc.relation.doihttps://doi.org/10.2174/1874129001004010001
dc.relation.ispartofseriesOpen Electrical and Electronic Engineering Journal 4 (2010)eng
dc.relation.issn1874-1290
dc.rights.licenseCC BY-NC 3.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by-nc/3.0/eng
dc.subjectElectrooptical modulationeng
dc.subjectGroup-III nitrideseng
dc.subjectPhotodetectorseng
dc.subjectPolarization-sensitive deviceseng
dc.subjectQuantum wellseng
dc.subjectCrystal structureeng
dc.subjectII-VI semiconductorseng
dc.subjectNitrideseng
dc.subjectPhotonseng
dc.subjectPolarizationeng
dc.subjectSemiconductor quantum wellseng
dc.subjectZinc oxideeng
dc.subjectElectro-optical modulationeng
dc.subjectGroup III nitrideseng
dc.subjectPiezoelectric polarizationseng
dc.subjectPolarization sensitiveeng
dc.subjectPolarization-sensitive deviceseng
dc.subjectSpectral selectivityeng
dc.subjectStrategic technologieseng
dc.subjectUltra-violet photodetectorseng
dc.subjectPhotodetectorseng
dc.subject.ddc620eng
dc.titleAdvances in group-III-nitride photodetectorseng
dc.typearticleeng
dc.typeTexteng
dcterms.bibliographicCitation.journalTitleOpen Electrical and Electronic Engineering Journaleng
tib.accessRightsopenAccesseng
wgl.contributorPDIeng
wgl.subjectIngenieurwissenschafteneng
wgl.typeZeitschriftenartikeleng
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