Selective lateral germanium growth for local GeOI fabrication

dc.bibliographicCitation.firstPageP353eng
dc.bibliographicCitation.issue11eng
dc.bibliographicCitation.lastPageP356eng
dc.bibliographicCitation.volume3
dc.contributor.authorYamamoto, Yuji
dc.contributor.authorSchubert, Markus Andreas
dc.contributor.authorReich, Christian
dc.contributor.authorBernd Tillack, Bernd Tillack
dc.date.accessioned2018-04-28T03:24:23Z
dc.date.available2019-06-28T07:30:32Z
dc.date.issued2014
dc.description.abstractHigh quality local Germanium-on-oxide (GeOI) wafers are fabricated using selective lateral germanium (Ge) growth technique by a single wafer reduced pressure chemical vapor deposition system. Mesa structures of 300 nm thick epitaxial silicon (Si) interposed by SiO2 cap and buried oxide are prepared. HCl vapor phase etching of Si is performed prior to selective Ge growth to remove a part of the epitaxial Si to form cavity under the mesa. By following selective Ge growth, the cavity was filled. Cross section TEM shows dislocations of Ge which are located near Si / Ge interface only. By plan view TEM, it is shown that the dislocations in Ge which direct to SiO2 cap or to buried-oxide (BOX) are located near the interface of Si and Ge. The dislocations which run parallel to BOX are observed only in [110] and [1–10] direction resulting Ge grown toward [010] direction contains no dislocations. This mechanism is similar to aspect-ratio-trapping but here we are using a horizontal approach, which offers the option to remove the defective areas by standard structuring techniques. A root mean square of roughness of ∼0.2 nm is obtained after the SiO2 cap removal. Tensile strain in the Ge layer is observed due to higher thermal expansion coefficient of Ge compared to Si and SiO2.
dc.description.versionpublishedVersioneng
dc.formatapplication/pdf
dc.identifier.urihttps://doi.org/10.34657/4862
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/1337
dc.language.isoengeng
dc.publisherPennington, NJ : ECS
dc.relation.doihttps://doi.org/10.1149/2.0071411jss
dc.relation.ispartofseriesECS Journal of Solid State Science and Technology, Volume 3, Issue 11, Page P353-P356eng
dc.rights.licenseCC BY 4.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/eng
dc.subject.ddc620
dc.titleSelective lateral germanium growth for local GeOI fabrication
dc.typeconferenceObjecteng
dc.typeTexteng
dcterms.bibliographicCitation.journalTitleECS Journal of Solid State Science and Technologyeng
tib.accessRightsopenAccesseng
wgl.contributorIHPeng
wgl.subjectIngenieurwissenschafteneng
wgl.typeKonferenzbeitrageng
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