Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

dc.bibliographicCitation.articleNumberSA0803
dc.bibliographicCitation.firstPageSA0803
dc.bibliographicCitation.issueSA
dc.bibliographicCitation.journalTitleJapanese Journal of Applied Physics
dc.bibliographicCitation.volume62
dc.contributor.authorKambara, Makoto
dc.contributor.authorKawaguchi, Satoru
dc.contributor.authorLee, Hae June
dc.contributor.authorIkuse, Kazumasa
dc.contributor.authorHamaguchi, Satoshi
dc.contributor.authorOhmori, Takeshi
dc.contributor.authorIshikawa, Kenji
dc.date.accessioned2025-02-26T09:42:03Z
dc.date.available2025-02-26T09:42:03Z
dc.date.issued2022
dc.description.abstractLow-temperature plasma-processing technologies are essential for material synthesis and device fabrication. Not only the utilization but also the development of plasma-related products and services requires an understanding of the multiscale hierarchies of complex behaviors of plasma-related phenomena, including plasma generation in physics and chemistry, transport of energy and mass through the sheath region, and morphology- and geometry-dependent surface reactions. Low-temperature plasma science and technology play a pivotal role in the exploration of new applications and in the development and control of plasma-processing methods. Presently, science-based and data-driven approaches to control systems are progressing with the state-of-the-art deep learning, machine learning, and artificial intelligence. In this review, researchers in material science and plasma processing, review and discuss the requirements and challenges of research and development in these fields. In particular, the prediction of plasma parameters and the discovery of processing recipes are asserted by outlining the emerging science-based, data-driven approaches, which are called plasma informatics.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/18594
dc.identifier.urihttps://doi.org/10.34657/17613
dc.language.isoeng
dc.publisherBristol : IOP Publ.
dc.relation.doihttps://doi.org/10.35848/1347-4065/ac9189
dc.relation.essn1347-4065
dc.relation.issn0021-4922
dc.rights.licenseCC BY 4.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by/4.0
dc.subject.ddc530
dc.subject.otherelectron dynamicseng
dc.subject.othermachine learning methodeng
dc.subject.otherplasma depositioneng
dc.subject.otherplasma etchingeng
dc.subject.otherplasma processeng
dc.subject.othervirtual metrologyeng
dc.titleScience-based, data-driven developments in plasma processing for material synthesis and device-integration technologieseng
dc.typeArticle
dc.typeText
tib.accessRightsopenAccess
wgl.contributorINP
wgl.subjectPhysikger
wgl.typeZeitschriftenartikelger
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