Dense arrays of uniform submicron pores in silicon and their applications
dc.bibliographicCitation.firstPage | 1160 | eng |
dc.bibliographicCitation.issue | 2 | eng |
dc.bibliographicCitation.lastPage | 1169 | eng |
dc.bibliographicCitation.volume | 7 | |
dc.contributor.author | Brodoceanu, Daniel | |
dc.contributor.author | Elnathan, Roey | |
dc.contributor.author | Prieto-Simón, Beatriz | |
dc.contributor.author | Delalat, Bahman | |
dc.contributor.author | Guinan, Taryn M. | |
dc.contributor.author | Kroner, Elmar Karsten | |
dc.contributor.author | Voelcker, Nicolas H. | |
dc.contributor.author | Kraus, Tobias | |
dc.date.accessioned | 2016-03-24T17:36:51Z | |
dc.date.available | 2019-06-28T12:39:01Z | |
dc.date.issued | 2015 | |
dc.description.abstract | We report a versatile particle-based route to dense arrays of parallel submicron pores with high aspect ratio in silicon, and explore the application of these arrays in sensors, optics, and polymer micropatterning. Polystyrene (PS) spheres are convectively assembled on gold-coated silicon wafers and sputter-etched, resulting in well-defined gold disc arrays with excellent long-range order. The gold discs act as catalysts in Metal-Assisted Chemical Etching (MACE), yielding uniform pores with straight walls, flat bottoms and high aspect ratio. The resulting pore arrays can be used as robust antireflective surfaces, in biosensing applications, and as templates for polymer replica molding. | eng |
dc.description.version | publishedVersion | eng |
dc.format | application/pdf | |
dc.identifier.uri | https://doi.org/10.34657/1448 | |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/4162 | |
dc.language.iso | eng | eng |
dc.publisher | Washington D.C. : American Chemical Society | eng |
dc.relation.doi | https://doi.org/10.1021/am506891d | |
dc.relation.ispartofseries | ACS Applied Materials and Interfaces, Volume 7, Issue 2, Page 1160-1169 | eng |
dc.rights.license | This document may be downloaded, read, stored and printed for your own use within the limits of § 53 UrhG but it may not be distributed via the internet or passed on to external parties. | eng |
dc.rights.license | Dieses Dokument darf im Rahmen von § 53 UrhG zum eigenen Gebrauch kostenfrei heruntergeladen, gelesen, gespeichert und ausgedruckt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden. | ger |
dc.subject | porous silicon | eng |
dc.subject | SALDI substrates | eng |
dc.subject | antireflective surfaces | eng |
dc.subject | colloidal lithography | eng |
dc.subject | metal-assisted chemical etching | eng |
dc.subject | polymer fibre arrays | eng |
dc.subject.ddc | 530 | eng |
dc.title | Dense arrays of uniform submicron pores in silicon and their applications | eng |
dc.type | article | eng |
dc.type | Text | eng |
dcterms.bibliographicCitation.journalTitle | ACS Applied Materials & Interfaces | eng |
tib.accessRights | openAccess | eng |
wgl.contributor | INM | eng |
wgl.subject | Physik | eng |
wgl.subject | Chemie | eng |
wgl.type | Zeitschriftenartikel | eng |
Files
Original bundle
1 - 1 of 1
Loading...
- Name:
- inm201516_post.pdf
- Size:
- 5.16 MB
- Format:
- Adobe Portable Document Format
- Description: