Dense arrays of uniform submicron pores in silicon and their applications

dc.bibliographicCitation.firstPage1160eng
dc.bibliographicCitation.issue2eng
dc.bibliographicCitation.lastPage1169eng
dc.bibliographicCitation.volume7
dc.contributor.authorBrodoceanu, Daniel
dc.contributor.authorElnathan, Roey
dc.contributor.authorPrieto-Simón, Beatriz
dc.contributor.authorDelalat, Bahman
dc.contributor.authorGuinan, Taryn M.
dc.contributor.authorKroner, Elmar Karsten
dc.contributor.authorVoelcker, Nicolas H.
dc.contributor.authorKraus, Tobias
dc.date.accessioned2016-03-24T17:36:51Z
dc.date.available2019-06-28T12:39:01Z
dc.date.issued2015
dc.description.abstractWe report a versatile particle-based route to dense arrays of parallel submicron pores with high aspect ratio in silicon, and explore the application of these arrays in sensors, optics, and polymer micropatterning. Polystyrene (PS) spheres are convectively assembled on gold-coated silicon wafers and sputter-etched, resulting in well-defined gold disc arrays with excellent long-range order. The gold discs act as catalysts in Metal-Assisted Chemical Etching (MACE), yielding uniform pores with straight walls, flat bottoms and high aspect ratio. The resulting pore arrays can be used as robust antireflective surfaces, in biosensing applications, and as templates for polymer replica molding.eng
dc.description.versionpublishedVersioneng
dc.formatapplication/pdf
dc.identifier.urihttps://doi.org/10.34657/1448
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/4162
dc.language.isoengeng
dc.publisherWashington D.C. : American Chemical Societyeng
dc.relation.doihttps://doi.org/10.1021/am506891d
dc.relation.ispartofseriesACS Applied Materials and Interfaces, Volume 7, Issue 2, Page 1160-1169eng
dc.rights.licenseThis document may be downloaded, read, stored and printed for your own use within the limits of § 53 UrhG but it may not be distributed via the internet or passed on to external parties.eng
dc.rights.licenseDieses Dokument darf im Rahmen von § 53 UrhG zum eigenen Gebrauch kostenfrei heruntergeladen, gelesen, gespeichert und ausgedruckt, aber nicht im Internet bereitgestellt oder an Außenstehende weitergegeben werden.ger
dc.subjectporous siliconeng
dc.subjectSALDI substrateseng
dc.subjectantireflective surfaceseng
dc.subjectcolloidal lithographyeng
dc.subjectmetal-assisted chemical etchingeng
dc.subjectpolymer fibre arrayseng
dc.subject.ddc530eng
dc.titleDense arrays of uniform submicron pores in silicon and their applicationseng
dc.typearticleeng
dc.typeTexteng
dcterms.bibliographicCitation.journalTitleACS Applied Materials & Interfaceseng
tib.accessRightsopenAccesseng
wgl.contributorINMeng
wgl.subjectPhysikeng
wgl.subjectChemieeng
wgl.typeZeitschriftenartikeleng
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