Chromium Trihalides CrX3 (X = Cl, Br, I): Direct Deposition of Micro- and Nanosheets on Substrates by Chemical Vapor Transport

dc.bibliographicCitation.firstPage1901410eng
dc.bibliographicCitation.issue24eng
dc.bibliographicCitation.volume6eng
dc.contributor.authorGrönke, Martin
dc.contributor.authorBuschbeck, Benjamin
dc.contributor.authorSchmidt, Peer
dc.contributor.authorValldor, Martin
dc.contributor.authorOswald, Steffen
dc.contributor.authorHao, Qi
dc.contributor.authorLubk, Axel
dc.contributor.authorWolf, Daniel
dc.contributor.authorSteiner, Udo
dc.contributor.authorBüchner, Bernd
dc.contributor.authorHampel, Silke
dc.date.accessioned2021-08-19T11:24:27Z
dc.date.available2021-08-19T11:24:27Z
dc.date.issued2019
dc.description.abstractThe experimental observation of intrinsic ferromagnetism in single layered chromium trihalides CrX3 (X = Cl, Br, I) has gained outstanding attention recently due to their possible implementation in spintronic devices. However, the reproducible preparation of highly crystalline chromium(III) halide nanolayers without stacking faults is still an experimental challenge. As chromium trihalides consist of adjacent layers with weak interlayer coupling, the preparation of ultrathin CrX3 nanosheets directly on substrates via vapor transport proves as an advantageous synthesis technique. It is demonstrated that vapor growth of ultrathin highly crystalline CrX3 micro- and nanosheets succeeds directly on yttrium stabilized zirconia substrates in a one-step process via chemical vapor transport (CVT) in temperature gradients of 100 K (600 °C → 500 °C for CrCl3 and 650 °C → 550 °C for CrBr3 or CrI3) without a need for subsequent delamination. Due to simulation results, optimization of synthesis conditions is realized and phase pure CrX3 nanosheets with thicknesses ≤25 nm are obtained via short term CVT. The nanosheets morphology, crystallinity, and phase purity are analyzed by several techniques, including microscopy, diffraction, and spectroscopy. Furthermore, a potential subsequent delamination technique is demonstrated to give fast access to CrX3 monolayers using the example of CrCl3. © 2018 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheimeng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/6530
dc.identifier.urihttps://doi.org/10.34657/5577
dc.language.isoengeng
dc.publisherWeinheim : Wiley-VCHeng
dc.relation.doihttps://doi.org/10.1002/admi.201901410
dc.relation.essn2196-7350
dc.relation.ispartofseriesAdvanced Materials Interfaces 6 (2019), Nr. 24eng
dc.rights.licenseCC BY-NC-ND 4.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/eng
dc.subjectchemical vapor transporteng
dc.subjectCrX3eng
dc.subjectcrystal growtheng
dc.subjectnanosheetseng
dc.subjecttransition metal halideseng
dc.subject.ddc540eng
dc.subject.ddc600eng
dc.titleChromium Trihalides CrX3 (X = Cl, Br, I): Direct Deposition of Micro- and Nanosheets on Substrates by Chemical Vapor Transporteng
dc.typearticleeng
dc.typeTexteng
dcterms.bibliographicCitation.journalTitleAdvanced Materials Interfaceseng
tib.accessRightsopenAccesseng
wgl.contributorIFWDeng
wgl.subjectChemieeng
wgl.typeZeitschriftenartikeleng
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