Plasma-based VAD process for multiply doped glass powders and high-performance fiber preforms with outstanding homogeneity
dc.bibliographicCitation.firstPage | 2000140 | eng |
dc.bibliographicCitation.issue | 12 | eng |
dc.bibliographicCitation.journalTitle | Plasma processes and polymers | eng |
dc.bibliographicCitation.volume | 17 | eng |
dc.contributor.author | Trautvetter, Tom | |
dc.contributor.author | Schäfer, Jan | |
dc.contributor.author | Benzine, Omar | |
dc.contributor.author | Methling, Ralf | |
dc.contributor.author | Baierl, Hardy | |
dc.contributor.author | Reichel, Volker | |
dc.contributor.author | Dellith, Jan | |
dc.contributor.author | Köpp, Daniel | |
dc.contributor.author | Hempel, Frank | |
dc.contributor.author | Stankov, Marjan | |
dc.contributor.author | Baeva, Margarita | |
dc.contributor.author | Foest, Rüdiger | |
dc.contributor.author | Wondraczek, Lothar | |
dc.contributor.author | Wondraczek, Katrin | |
dc.contributor.author | Bartelt, Hartmut | |
dc.date.accessioned | 2021-12-10T06:46:31Z | |
dc.date.available | 2021-12-10T06:46:31Z | |
dc.date.issued | 2020 | |
dc.description.abstract | An innovative approach using the vapor axial deposition (VAD), for the preparation of silica-based high-power fiber laser preforms, is described in this study. The VAD uses a plasma deposition system operating at atmospheric pressure, fed by a single, chemically adapted solution containing precursors of laser-active dopants (e.g., Yb2O3), glass-modifier species (e.g., Al2O3), and the silica matrix. The approach enables simultaneous doping with multiple optically active species and overcomes some of the current technological limitations encountered with well-established fiber preform technologies in terms of dopant distribution, doping levels, and achievable active core diameter. The deposition of co-doped silica with outstanding homogeneity is proven by Raman spectroscopy and electron probe microanalysis. Yb2O3 concentrations are realized up to 0.3 mol% in SiO2, with simultaneous doping of 3 mol% of Al2O3. | eng |
dc.description.version | publishedVersion | eng |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/7670 | |
dc.identifier.uri | https://doi.org/10.34657/6717 | |
dc.language.iso | eng | eng |
dc.publisher | Hoboken, NJ : Wiley Interscience | eng |
dc.relation.doi | https://doi.org/10.1002/ppap.202000140 | |
dc.relation.essn | 1612-8869 | |
dc.rights.license | CC BY 4.0 Unported | |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | eng |
dc.subject.ddc | 530 | eng |
dc.subject.ddc | 540 | eng |
dc.subject.other | atmospheric pressure | eng |
dc.subject.other | dopant homogeneity | eng |
dc.subject.other | microwave plasma | eng |
dc.subject.other | preform fabrication | eng |
dc.subject.other | silica | eng |
dc.title | Plasma-based VAD process for multiply doped glass powders and high-performance fiber preforms with outstanding homogeneity | eng |
dc.type | Article | eng |
dc.type | Text | eng |
tib.accessRights | openAccess | eng |
wgl.contributor | INP | eng |
wgl.contributor | IPHT | eng |
wgl.subject | Physik | eng |
wgl.type | Zeitschriftenartikel | eng |
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