Plasma-based VAD process for multiply doped glass powders and high-performance fiber preforms with outstanding homogeneity

dc.bibliographicCitation.firstPage2000140eng
dc.bibliographicCitation.issue12eng
dc.bibliographicCitation.journalTitlePlasma processes and polymerseng
dc.bibliographicCitation.volume17eng
dc.contributor.authorTrautvetter, Tom
dc.contributor.authorSchäfer, Jan
dc.contributor.authorBenzine, Omar
dc.contributor.authorMethling, Ralf
dc.contributor.authorBaierl, Hardy
dc.contributor.authorReichel, Volker
dc.contributor.authorDellith, Jan
dc.contributor.authorKöpp, Daniel
dc.contributor.authorHempel, Frank
dc.contributor.authorStankov, Marjan
dc.contributor.authorBaeva, Margarita
dc.contributor.authorFoest, Rüdiger
dc.contributor.authorWondraczek, Lothar
dc.contributor.authorWondraczek, Katrin
dc.contributor.authorBartelt, Hartmut
dc.date.accessioned2021-12-10T06:46:31Z
dc.date.available2021-12-10T06:46:31Z
dc.date.issued2020
dc.description.abstractAn innovative approach using the vapor axial deposition (VAD), for the preparation of silica-based high-power fiber laser preforms, is described in this study. The VAD uses a plasma deposition system operating at atmospheric pressure, fed by a single, chemically adapted solution containing precursors of laser-active dopants (e.g., Yb2O3), glass-modifier species (e.g., Al2O3), and the silica matrix. The approach enables simultaneous doping with multiple optically active species and overcomes some of the current technological limitations encountered with well-established fiber preform technologies in terms of dopant distribution, doping levels, and achievable active core diameter. The deposition of co-doped silica with outstanding homogeneity is proven by Raman spectroscopy and electron probe microanalysis. Yb2O3 concentrations are realized up to 0.3 mol% in SiO2, with simultaneous doping of 3 mol% of Al2O3.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/7670
dc.identifier.urihttps://doi.org/10.34657/6717
dc.language.isoengeng
dc.publisherHoboken, NJ : Wiley Interscienceeng
dc.relation.doihttps://doi.org/10.1002/ppap.202000140
dc.relation.essn1612-8869
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/eng
dc.subject.ddc530eng
dc.subject.ddc540eng
dc.subject.otheratmospheric pressureeng
dc.subject.otherdopant homogeneityeng
dc.subject.othermicrowave plasmaeng
dc.subject.otherpreform fabricationeng
dc.subject.othersilicaeng
dc.titlePlasma-based VAD process for multiply doped glass powders and high-performance fiber preforms with outstanding homogeneityeng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccesseng
wgl.contributorINPeng
wgl.contributorIPHTeng
wgl.subjectPhysikeng
wgl.typeZeitschriftenartikeleng
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