The role of substrate temperature and magnetic filtering for DLC by cathodic arc evaporation

dc.bibliographicCitation.firstPage345eng
dc.bibliographicCitation.issue5eng
dc.bibliographicCitation.journalTitleCoatingseng
dc.bibliographicCitation.volume9eng
dc.contributor.authorLux, Helge
dc.contributor.authorEdling, Matthias
dc.contributor.authorLucci, Massimiliano
dc.contributor.authorKitzmann, Julia
dc.contributor.authorVillringer, Claus
dc.contributor.authorSiemroth, Peter
dc.contributor.authorDe Matteis, Fabio
dc.contributor.authorSchrader, Sigurd
dc.date.accessioned2021-09-10T06:05:38Z
dc.date.available2021-09-10T06:05:38Z
dc.date.issued2019
dc.description.abstractDiamond-like carbon (DLC) films were deposited using two different types of high current arc evaporation. The first process used a magnetic particle filter to remove droplets from the plasma. For the second process, the samples were put into a metallic cage which was placed directly above the plasma source. For both processes, we varied the substrate temperature from 21 to 350 °C in order to investigate the temperature effect. The samples were characterized using SEM, AFM, XPS, Raman Spectroscopy, Ellipsometry, Photometry, and Nano Indentation in order to compare both methods of deposition and provide a careful characterization of such DLC films. We found that the sp3 content and the hardness can be precisely adjusted by changing the substrate temperature. Furthermore, in the case of unfiltered deposition, the optical constants can be shifted in the direction of higher absorbance in order to produce black and hard carbon coatings. © 2019 by the authors.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/6777
dc.identifier.urihttps://doi.org/10.34657/5824
dc.language.isoengeng
dc.publisherBasel : MDPIeng
dc.relation.doihttps://doi.org/10.3390/COATINGS9050345
dc.relation.essn2079-6412
dc.rights.licenseCC BY 4.0 Unportedeng
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/eng
dc.subject.ddc660eng
dc.subject.otherArc evaporationeng
dc.subject.otherDLCeng
dc.subject.otherEllipsometryeng
dc.subject.otherHardnesseng
dc.subject.otherOptical constantseng
dc.subject.otherSubstrate temperatureeng
dc.subject.otherTa-Ceng
dc.titleThe role of substrate temperature and magnetic filtering for DLC by cathodic arc evaporationeng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccesseng
wgl.contributorIHPeng
wgl.subjectChemieeng
wgl.typeZeitschriftenartikeleng
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