The thermal stability of epitaxial GeSn layers

dc.bibliographicCitation.firstPage076108
dc.bibliographicCitation.issue7
dc.bibliographicCitation.journalTitleAPL Materialseng
dc.bibliographicCitation.volume6
dc.contributor.authorZaumseil, P.
dc.contributor.authorHou, Y.
dc.contributor.authorSchubert, M.A.
dc.contributor.authorvon den Driesch, N.
dc.contributor.authorStange, D.
dc.contributor.authorRainko, D.
dc.contributor.authorVirgilio, M.
dc.contributor.authorBuca, D.
dc.contributor.authorCapellini, G.
dc.date.accessioned2023-02-06T10:22:45Z
dc.date.available2023-02-06T10:22:45Z
dc.date.issued2018
dc.description.abstractWe report on the direct observation of lattice relaxation and Sn segregation of GeSn/Ge/Si heterostructures under annealing. We investigated strained and partially relaxed epi-layers with Sn content in the 5 at. %-12 at. % range. In relaxed samples, we observe a further strain relaxation followed by a sudden Sn segregation, resulting in the separation of a β-Sn phase. In pseudomorphic samples, a slower segregation process progressively leads to the accumulation of Sn at the surface only. The different behaviors are explained by the role of dislocations in the Sn diffusion process. The positive impact of annealing on optical emission is also discussed.eng
dc.description.versionpublishedVersioneng
dc.identifier.urihttps://oa.tib.eu/renate/handle/123456789/11288
dc.identifier.urihttp://dx.doi.org/10.34657/10324
dc.language.isoeng
dc.publisherMelville, NY : AIP Publ.
dc.relation.doihttps://doi.org/10.1063/1.5036728
dc.relation.essn2166-532X
dc.rights.licenseCC BY 4.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by/4.0
dc.subject.ddc620
dc.subject.ddc600
dc.subject.otherDiffusion processeng
dc.subject.otherDirect observationseng
dc.subject.otherLattice relaxationeng
dc.subject.otherOptical emissionseng
dc.subject.otherPositive impactseng
dc.subject.otherSegregation processeng
dc.subject.otherSn contentseng
dc.titleThe thermal stability of epitaxial GeSn layerseng
dc.typeArticleeng
dc.typeTexteng
tib.accessRightsopenAccess
wgl.contributorIHP
wgl.subjectIngenieurwissenschaftenger
wgl.typeZeitschriftenartikelger
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