Epitaxial growth of the first two members of the Ban +1InnO2.5 n +1Ruddlesden-Popper homologous series
dc.bibliographicCitation.firstPage | 062707 | |
dc.bibliographicCitation.issue | 6 | |
dc.bibliographicCitation.journalTitle | Journal of Vacuum Science & Technology A | eng |
dc.bibliographicCitation.volume | 40 | |
dc.contributor.author | Hensling, Felix V. E. | |
dc.contributor.author | Smeaton, Michelle A. | |
dc.contributor.author | Show, Veronica | |
dc.contributor.author | Azizie, Kathy | |
dc.contributor.author | Barone, Matthew R. | |
dc.contributor.author | Kourkoutis, Lena F. | |
dc.contributor.author | Schlom, Darrell G. | |
dc.date.accessioned | 2023-02-06T10:22:46Z | |
dc.date.available | 2023-02-06T10:22:46Z | |
dc.date.issued | 2022 | |
dc.description.abstract | We demonstrate the epitaxial growth of the first two members, and the n = ∞ member of the homologous Ruddlesden-Popper series of Ba n + 1 In n O 2.5 n + 1 of which the n = 1 member was previously unknown. The films were grown by suboxide molecular-beam epitaxy where the indium is provided by a molecular beam of indium-suboxide [In 2O (g)]. To facilitate ex situ characterization of the highly hygroscopic barium indate films, a capping layer of amorphous SiO 2 was deposited prior to air exposure. The structural quality of the films was assessed by x-ray diffraction, reflective high-energy electron diffraction, and scanning transmission electron microscopy. | eng |
dc.description.version | publishedVersion | eng |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/11307 | |
dc.identifier.uri | http://dx.doi.org/10.34657/10343 | |
dc.language.iso | eng | |
dc.publisher | New York, NY : American Institute of Physics | |
dc.relation.doi | https://doi.org/10.1116/6.0002205 | |
dc.relation.essn | 1520-8559 | |
dc.relation.issn | 0734-2101 | |
dc.rights.license | CC BY 4.0 Unported | |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0 | |
dc.subject.ddc | 530 | |
dc.subject.other | Air-exposure | eng |
dc.subject.other | Capping layer | eng |
dc.subject.other | Ex situ | eng |
dc.subject.other | Homologous series | eng |
dc.subject.other | Molecular-beam epitaxy | eng |
dc.subject.other | Ruddlesden-Popper | eng |
dc.subject.other | Ruddlesden-Popper series | eng |
dc.subject.other | SiO 2 | eng |
dc.subject.other | Situ characterization | eng |
dc.subject.other | Structural qualities | eng |
dc.title | Epitaxial growth of the first two members of the Ban +1InnO2.5 n +1Ruddlesden-Popper homologous series | eng |
dc.type | Article | eng |
dc.type | Text | eng |
tib.accessRights | openAccess | |
wgl.contributor | IKZ | |
wgl.subject | Physik | ger |
wgl.type | Zeitschriftenartikel | ger |
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