Wide-range strain tunability provided by epitaxial LaAl1−xScxO3 template films
dc.bibliographicCitation.journalTitle | New Journal of Physics | eng |
dc.bibliographicCitation.volume | 12 | |
dc.contributor.author | Herklotz, Andreas | |
dc.contributor.author | Biegalski, Michael D. | |
dc.contributor.author | Kim, Hyun-Sik | |
dc.contributor.author | Schultz, Ludwig | |
dc.contributor.author | Dörr, Kathrin | |
dc.contributor.author | Christen, Hans M. | |
dc.date.accessioned | 2018-06-12T16:44:16Z | |
dc.date.available | 2019-06-28T12:40:02Z | |
dc.date.issued | 2010 | |
dc.description.abstract | The dielectric diamagnetic LaAl1− xScxO3 (LASO) (x=0–1) is proposed for adjusting of the biaxial in-plane lattice parameter of oxide substrates in the wide range from 3.79 to 4.05 Å (6.5%). This range includes the pseudocubic lattice parameters of most of the currently investigated complex oxides. The in-plane lattice parameter of strain-relaxed LASO films depends linearly on the composition, and these films grow with a smooth surface. On several different LASO-buffered substrates, ferromagnetic La0.7Sr0.3MnO3 (LSMO) films have been grown in predetermined strain states. A series of 30 nm thick LSMO films on LASO-buffered LaSrAlO4(001) demonstrates that continuously controlled coherent strains in a wide range, in this case from − 1 to +0.6%, can be obtained for the functional oxide films grown on LASO. | eng |
dc.description.version | publishedVersion | eng |
dc.format | application/pdf | |
dc.identifier.uri | https://doi.org/10.34657/1710 | |
dc.identifier.uri | https://oa.tib.eu/renate/handle/123456789/4379 | |
dc.language.iso | eng | eng |
dc.publisher | Milton Park : Taylor & Francis | eng |
dc.relation.doi | https://doi.org/10.1088/1367-2630/12/11/113053 | |
dc.rights.license | CC BY-NC-SA 3.0 Unported | eng |
dc.rights.uri | https://creativecommons.org/licenses/by-nc-sa/3.0/ | eng |
dc.subject.ddc | 530 | eng |
dc.subject.other | Buffered substrates | eng |
dc.subject.other | Coherent strain | eng |
dc.subject.other | Complex oxides | eng |
dc.subject.other | Functional oxide films | eng |
dc.subject.other | In-plane lattice parameters | eng |
dc.subject.other | Lattice parameters | eng |
dc.subject.other | LSMO films | eng |
dc.subject.other | Oxide substrates | eng |
dc.subject.other | Pseudocubic | eng |
dc.subject.other | Smooth surface | eng |
dc.subject.other | Strain state | eng |
dc.subject.other | Strain-relaxed | eng |
dc.subject.other | Template films | eng |
dc.subject.other | Tunabilities | eng |
dc.title | Wide-range strain tunability provided by epitaxial LaAl1−xScxO3 template films | eng |
dc.type | Article | eng |
dc.type | Text | eng |
tib.accessRights | openAccess | eng |
wgl.contributor | IFWD | eng |
wgl.subject | Physik | eng |
wgl.type | Zeitschriftenartikel | eng |
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